Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7902612 | Semiconductor device and method of manufacturing the same | Takashi Yamauchi, Atsuhiro Kinoshita, Yoshinori Tsuchiya, Junji Koga, Koichi Kato +1 more | 2011-03-08 |
| 7875976 | Semiconductor device including a silicide layer and a dielectric layer | Makoto Wada, Takamasa Usui | 2011-01-25 |
| 7456096 | Method of manufacturing silicide layer for semiconductor device | Takashi Yamauchi, Atsuhiro Kinoshita, Yoshinori Tsuchiya, Junji Koga, Koichi Kato +1 more | 2008-11-25 |
| 7183168 | Method of manufacturing a semiconductor device having a silicide film | Satoshi Matsuda | 2007-02-27 |
| 7148096 | Method of manufacturing a semiconductor device having a gate electrode containing polycrystalline silicon-germanium | — | 2006-12-12 |
| 7141467 | Semiconductor device having metal silicide films formed on source and drain regions and method for manufacturing the same | Akira Hokazono | 2006-11-28 |
| 6897534 | Semiconductor device having gate electrode of stacked structure including polysilicon layer and metal layer and method of manufacturing the same | Atsushi Azuma | 2005-05-24 |
| 6891232 | Semiconductor device having an injection substance to knock against oxygen and manufacturing method of the same | Kiyotaka Miyano, Ichiro Mizushima | 2005-05-10 |
| 6878579 | Semiconductor device and method of manufacturing the same | Hironobu Fukui | 2005-04-12 |
| 6841429 | Method of manufacturing a semiconductor device having a silicide film | Satoshi Matsuda | 2005-01-11 |
| 6791106 | Semiconductor device and method of manufacturing the same | Hironobu Fukui | 2004-09-14 |
| 6762468 | Semiconductor device and method of manufacturing the same | — | 2004-07-13 |
| 6744104 | Semiconductor integrated circuit including insulated gate field effect transistor and method of manufacturing the same | Nobutoshi Aoki, Ichiro Mizushima | 2004-06-01 |
| 6677660 | Semiconductor device having silicide film | Satoshi Matsuda | 2004-01-13 |
| 6642585 | Semiconductor device having gate electrode of stacked structure including polysilicon layer and metal layer and method of manufacturing the same | Atsushi Azuma | 2003-11-04 |
| 6525403 | Semiconductor device having MIS field effect transistors or three-dimensional structure | Satoshi Inaba | 2003-02-25 |
| 6498374 | MOS semiconductor device having gate insulating film containing nitrogen | — | 2002-12-24 |
| 5917223 | Semiconductor device having salicide layer | Hideki Shibata | 1999-06-29 |
| 5734181 | Semiconductor device and manufacturing method therefor | Ryuji Ohba, Tomohisa Mizuno, Makoto Yoshimi | 1998-03-31 |
| 5463234 | High-speed semiconductor gain memory cell with minimal area occupancy | Akira Toriumi, Naoyuki Shigyo, Tetsunori Wada, Hiroyoshi Tanimoto, Makoto Yoshimi | 1995-10-31 |