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USPTO Patent Rankings Data through Dec 31, 2025
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George E. Bailey — 14 Patents

LSLsi: 13 patents #243 of 3,238Top 8%
GE: 1 patents #19,940 of 36,430Top 55%
Dublin, OH: #78 of 1,143 inventorsTop 7%
Ohio: #5,406 of 73,341 inventorsTop 8%
Overall (All Time): #332,869 of 4,157,543Top 9%
14 Patents All Time
George E. Bailey has been granted 14 US patents. The first was granted in 2000 and the most recent in June 2008. George E. Bailey ranks #332,869 of 4,157,543 US inventors in our database (top 8.0%). Patent records list George E. Bailey in Dublin, OH, US.

Patents per Year

Patents granted per year, 2000 to 2008Bar chart with a peak of 5 patents in 2005.peak 52000: 1 patents20002003: 1 patents20032004: 2 patents20042005: 5 patents20052006: 3 patents20062007: 1 patents20072008: 1 patents2008

Issued Patents All Time

Showing 1–14 of 14 patents

Patent #TitleCo-InventorsDateApprox Value ⓘ
7381502 Apparatus and method to improve the resolution of photolithography systems by improving the temperature stability of the reticle Michael Berman 2008-06-03 $53,825,000
7298458 Optical error minimization in a semiconductor manufacturing apparatus Michael Berman 2007-11-20 $5,242,000
7098996 Optical error minimization in a semiconductor manufacturing apparatus Michael Berman 2006-08-29 $5,103,000
7023530 Dual source lithography for direct write application Michael Berman 2006-04-04 $3,131,000
7005217 Chromeless phase shift mask Neal Callan, John V. Jensen 2006-02-28 $2,302,000
6943055 Method and apparatus for detecting backside contamination during fabrication of a semiconductor wafer Michael Berman, Rennie Barber 2005-09-13 $4,621,000
6934929 Method for improving OPC modeling Travis Brist 2005-08-23 $3,565,000
6894762 Dual source lithography for direct write application Michael Berman 2005-05-17 $3,135,000
6885436 Optical error minimization in a semiconductor manufacturing apparatus Michael Berman 2005-04-26 $2,840,000
6866970 Apparatus and method to improve the resolution of photolithography systems by improving the temperature stability of the reticle Michael Berman 2005-03-15 $2,835,000
6782525 Wafer process critical dimension, alignment, and registration analysis simulation tool Mario Garza, Neal Callan, Travis Brist, Paul G. Filseth 2004-08-24 $1,813,000
6764749 Method to improve the resolution of a photolithography system by use of a coupling layer between the photo resist and the ARC Michael Berman 2004-07-20 $3,296,000
6627466 Method and apparatus for detecting backside contamination during fabrication of a semiconductor wafer Michael Berman, Rennie Barber 2003-09-30 $5,924,000
6102143 Shaped polycrystalline cutter elements Shelly R. Snyder, Eoin M. O'Tighearnaigh 2000-08-15 $143,806,000

Frequent Collaborators

Michael Berman10 shared
Rennie Barber2 shared
Neal Callan2 shared
Travis Brist2 shared
Shelly R. Snyder1 shared
Mario Garza1 shared

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