Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Wafer process critical dimension, alignment, and registration analysis simulation tool

Wafer process critical dimension, alignment, and registration analysis simulation tool

US Patent 6782525 · Granted Aug 24, 2004

Estimated economic value: $1,813,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Computational wafer inspection2024
Computational wafer inspection2021
Computational wafer inspection2020
Computational wafer inspection2018
Computational wafer inspection2016
Maskless vortex phase shift optical direct write lithography2015
Correcting errors in miscorrected codewords using list decoding2014
Alternate galois field advanced encryption standard round2013
Maskless vortex phase shift optical direct write lithography2013
High performance arithmetic logic unit (ALU) for cryptographic applications with2013
Maskless vortex phase shift optical direct write lithography2011
Multimode block cipher architectures2011