{"@context": "https://schema.org", "@type": "BreadcrumbList", "itemListElement": [{"@type": "ListItem", "position": 1, "name": "Home", "item": "https://www.patentleaderboard.com/"}, {"@type": "ListItem", "position": 2, "name": "Apparatus and method to improve the resolution of photolithography systems by improving the temperature stability of the reticle", "item": "https://www.patentleaderboard.com/patent/6866970"}]}
Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025

Apparatus and method to improve the resolution of photolithography systems by improving the temperature stability of the reticle

US Patent 6866970 · Granted Mar 15, 2005

Estimated economic value: $2,835,000

Assignee

Inventors

View full patent text on Google Patents →