Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8553198 | Mask pattern correction device, method of correcting mask pattern, light exposure correction device, and method of correcting light exposure | Satoru Asai, Morimi Osawa, Hiromi Hoshino, Kouzou Ogino, Kazumasa Morishita | 2013-10-08 |
| 8227153 | Mask pattern correction device, method of correcting mask pattern, light exposure correction device, and method of correcting light exposure | Satoru Asai, Morimi Osawa, Hiromi Hoshino, Kouzou Ogino, Kazumasa Morishita | 2012-07-24 |
| 7732103 | Photomask, focus measurement apparatus and focus measurement method | — | 2010-06-08 |
| 7732107 | Mask pattern correction device, method of correcting mask pattern, light exposure correction device, and method of correcting light exposure | Satoru Asai, Morimi Osawa, Hiromi Hoshino, Kouzou Ogino, Kazumasa Morishita | 2010-06-08 |
| 7604912 | Local flare correction | Satoru Asai | 2009-10-20 |
| 7601471 | Apparatus and method for correcting pattern dimension and photo mask and test photo mask | Morimi Osawa, Hiroshi Arimoto, Satoru Asai | 2009-10-13 |
| 7479356 | Aligning method | — | 2009-01-20 |
| 7240307 | Pattern size correcting device and pattern size correcting method | Hajime Aoyama, Morimi Osawa, Kozo Ogino | 2007-07-03 |
| 6986973 | Test photomask, flare evaluation method, and flare compensation method | Isamu Hanyu, Katsuyoshi Kirikoshi | 2006-01-17 |
| 6420095 | Manufacture of semiconductor device using A-C anti-reflection coating | Eiichi Kawamura, Nobuhisa Naori, Koichi Hashimoto, Masaharu Kobayashi, Tadasi Oshima | 2002-07-16 |
| 5750316 | Manufacture of semiconductor device using a-c anti-reflection coating | Eiichi Kawamura, Nobuhisa Naori, Koichi Hashimoto, Masaharu Kobayashi, Tadasi Oshima | 1998-05-12 |