Issued Patents All Time
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8553198 | Mask pattern correction device, method of correcting mask pattern, light exposure correction device, and method of correcting light exposure | Teruyoshi Yao, Satoru Asai, Hiromi Hoshino, Kouzou Ogino, Kazumasa Morishita | 2013-10-08 |
| 8227153 | Mask pattern correction device, method of correcting mask pattern, light exposure correction device, and method of correcting light exposure | Teruyoshi Yao, Satoru Asai, Hiromi Hoshino, Kouzou Ogino, Kazumasa Morishita | 2012-07-24 |
| 7971160 | Creating method of photomask pattern data, photomask created by using the photomask pattern data, and manufacturing method of semiconductor apparatus using the photomask | Takayoshi Minami, Satoru Asai | 2011-06-28 |
| 7870520 | Semiconductor device and yield calculation method | — | 2011-01-11 |
| 7732107 | Mask pattern correction device, method of correcting mask pattern, light exposure correction device, and method of correcting light exposure | Teruyoshi Yao, Satoru Asai, Hiromi Hoshino, Kouzou Ogino, Kazumasa Morishita | 2010-06-08 |
| 7601471 | Apparatus and method for correcting pattern dimension and photo mask and test photo mask | Teruyoshi Yao, Hiroshi Arimoto, Satoru Asai | 2009-10-13 |
| 7240307 | Pattern size correcting device and pattern size correcting method | Hajime Aoyama, Teruyoshi Yao, Kozo Ogino | 2007-07-03 |
| 7205078 | Method for generating backscattering intensity on the basis of lower layer structure in charged particle beam exposure, and method for fabricating semiconductor device utilizing this method | Kozo Ogino | 2007-04-17 |
| 6862726 | Light intensity simulation method, program product, and designing method of photomask | Hiroki Futatsuya | 2005-03-01 |
| 6677089 | Rectangle/lattice data conversion method for charged particle beam exposure mask pattern and charged particle beam exposure method | Kozo Ogino | 2004-01-13 |