Issued Patents All Time
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8429573 | Data generation method for semiconductor device, and electron beam exposure system | Hiromi Hoshino | 2013-04-23 |
| 8298732 | Exposure method and method of making a semiconductor device | Masahiko Minemura, Seiji Makino, Kanji Takeuchi, Noboru Sugiyama | 2012-10-30 |
| 8158312 | Exposure method using charged particle beam | — | 2012-04-17 |
| 8141009 | Preparing data for hybrid exposure using both electron beam exposure and reticle exposure in lithographic process | Masaaki Miyajima, Hiromi Hoshino, Hiroshi Takita | 2012-03-20 |
| 8048600 | Parameter extracting method | — | 2011-11-01 |
| 8022376 | Method for manufacturing semiconductor device or photomask | Takashi Maruyama | 2011-09-20 |
| 7977018 | Exposure data preparation method and exposure method | Yasuhide Machida | 2011-07-12 |
| 7939246 | Charged particle beam projection method | — | 2011-05-10 |
| 7861210 | Exposure data generator and method thereof | Hiromi Hoshino | 2010-12-28 |
| 7707540 | Exposure data generation method and device, exposure data verification method and device and storage medium | — | 2010-04-27 |
| 7500219 | Exposure data generator and method thereof | Hiromi Hoshino | 2009-03-03 |
| 7240307 | Pattern size correcting device and pattern size correcting method | Hajime Aoyama, Morimi Osawa, Teruyoshi Yao | 2007-07-03 |
| 7205078 | Method for generating backscattering intensity on the basis of lower layer structure in charged particle beam exposure, and method for fabricating semiconductor device utilizing this method | Morimi Osawa | 2007-04-17 |
| 6677089 | Rectangle/lattice data conversion method for charged particle beam exposure mask pattern and charged particle beam exposure method | Morimi Osawa | 2004-01-13 |
| 6544700 | Charged particle beam exposure method | — | 2003-04-08 |