Issued Patents All Time
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8141009 | Preparing data for hybrid exposure using both electron beam exposure and reticle exposure in lithographic process | Masaaki Miyajima, Hiromi Hoshino, Kozo Ogino | 2012-03-20 |
| 7587703 | Layout determination method, method of manufacturing semiconductor devices, and computer readable program | Takashi Maruyama | 2009-09-08 |
| 7569842 | Method for correcting electron beam exposure data | — | 2009-08-04 |
| 6821685 | Block mask making method, block mask and exposure apparatus | Hiromi Hoshino | 2004-11-23 |