Issued Patents All Time
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6685796 | CMP uniformity | Chenting Lin, Robert J. van den Berg | 2004-02-03 |
| 6443811 | Ceria slurry solution for improved defect control of silicon dioxide chemical-mechanical polishing | Haruki Nojo, Jeremy Stephens, Ravikumar Ramachandran | 2002-09-03 |
| 6429131 | CMP uniformity | Chenting Lin, Robert van den Berg | 2002-08-06 |
| 6358850 | Slurry-less chemical-mechanical polishing of oxide materials | Laertis Economikos, Ronald J. Schutz, Ravikumar Ramachandran | 2002-03-19 |
| 6264789 | System for dispensing polishing liquid during chemical mechanical polishing of a semiconductor wafer | Fen F. Jamin | 2001-07-24 |
| 6225224 | System for dispensing polishing liquid during chemical mechanical polishing of a semiconductor wafer | Fen F. Jamin | 2001-05-01 |