SC

Scott Coston

AN Asml Holding N.V.: 12 patents #30 of 520Top 6%
AB Asml Netherlands B.V.: 3 patents #1,156 of 3,192Top 40%
Overall (All Time): #385,829 of 4,157,543Top 10%
13
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
10466601 Alignment sensor for lithographic apparatus Alessandro Polo, Simon Gijsbert Josephus Mathijssen, Patricius Aloysius Jacobus Tinnemans, Ronan James Havelin 2019-11-05
8164739 Controlling fluctuations in pointing, positioning, size or divergence errors of a beam of light for optical apparatus 2012-04-24
8164740 Illumination system coherence remover with two sets of stepped mirrors Huibert Visser, Jacob Klinkhamer, Lev Ryzhikov, Adel Joobeur, Rob Vink +1 more 2012-04-24
8159651 Illumination system coherence remover with a series of partially reflective surfaces Huibert Visser, Jacob Klinkhamer, Lev Ryzhikov, Adel Joobeur, Rob Vink +1 more 2012-04-17
8013979 Illumination system with low telecentricity error and dynamic telecentricity correction Lev Ryzhikov, James Tsacoyeanes, Roberto B. Wiener 2011-09-06
7187430 Advanced illumination system for use in microlithography Mark Oskotsky, Lev Ryzhikov, James Tsacoyeanes, Walter Augustyn 2007-03-06
7158307 Efficiently illuminating a modulating device Wenceslao A. Cebuhar, Jason Hintersteiner 2007-01-02
7079321 Illumination system and method allowing for varying of both field height and pupil Richard Guerra 2006-07-18
7006295 Illumination system and method for efficiently illuminating a pattern generator Wenceslao A. Cebuhar, Jason Hintersteiner 2006-02-28
6888615 System and method for improving linewidth control in a lithography device by varying the angular distribution of light in an illuminator as a function of field position James Tsacoyeanes 2005-05-03
6813003 Advanced illumination system for use in microlithography Mark Oskotsky, Lev Ryzhikov, James Tsacoyeanes, Walter Augustyn 2004-11-02
6784976 System and method for improving line width control in a lithography device using an illumination system having pre-numerical aperture control James Tsacoyeanes 2004-08-31
6775069 Advanced illumination system for use in microlithography Mark Oskotsky, Lev Ryzhikov, James Tsacoyeanes, Peter Baumgartner, Walter Augustyn 2004-08-10