Issued Patents All Time
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5399456 | Image reversal negative working photoresist containing O-quinone diazide and cross-linking compound | Mark A. Spak, Donald Mammato, Dana L. Durham | 1995-03-21 |
| 5256522 | Image reversal negative working O-naphthoquinone diazide and cross-linking compound containing photoresist process with thermal curing | Mark A. Spak, Donald Mammato, Dana L. Durham | 1993-10-26 |
| 5240807 | Photoresist article having a portable, conformable, built-on mask | Salvatore Emmi, Thomas S. Phillips | 1993-08-31 |
| 5217840 | Image reversal negative working o-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment and element produced therefrom | Mark A. Spak, Donald Mammato, Dana L. Durham | 1993-06-08 |
| 5019488 | Method of producing an image reversal negative photoresist having a photo-labile blocked imide | Donald Mammato, Dana L. Durham, Mark A. Spak, Douglas A. Usifer, Michael J. McFarland | 1991-05-28 |
| 4931381 | Image reversal negative working O-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment | Mark A. Spak, Donald Mammato, Dana L. Durham | 1990-06-05 |
| 4929536 | Image reversal negative working O-napthoquinone diazide and cross-linking compound containing photoresist process with thermal curing | Mark A. Spak, Donald Mammato, Dana L. Durham | 1990-05-29 |
| 4863827 | Postive working multi-level photoresist | Yuh-Loo Chang | 1989-09-05 |
| 4835086 | Polysulfone barrier layer for bi-level photoresists | — | 1989-05-30 |
| 4588670 | Light-sensitive trisester of O-quinone diazide containing composition for the preparation of a positive-acting photoresist | Michael G. Kelly, Donald Mammato, Dana L. Durham, Lawrence N. Crane | 1986-05-13 |