Issued Patents All Time
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9896763 | Particle reactor for atomic layer deposition (ALD) and chemical vapor deposition (CVD) processes | Gayatri Vyas Dadheech, Mei Cai | 2018-02-20 |
| 7365005 | Method for filling of a recessed structure of a semiconductor device | — | 2008-04-29 |
| 6812157 | Apparatus for atomic layer chemical vapor deposition | — | 2004-11-02 |
| 6563092 | Measurement of substrate temperature in a process chamber using non-contact filtered infrared pyrometry | Krishnan Shrinivasan, Arkadiy Shimanovich | 2003-05-13 |
| 6387185 | Processing chamber for atomic layer deposition processes | Kenneth Brian Doering, Carl Galewski, Thomas E. Seidel | 2002-05-14 |
| 6174377 | Processing chamber for atomic layer deposition processes | Kenneth Brian Doering, Carl Galewski, Thomas E. Seidel | 2001-01-16 |
| 5879459 | Vertically-stacked process reactor and cluster tool system for atomic layer deposition | Thomas E. Seidel | 1999-03-09 |
| 5284519 | Inverted diffuser stagnation point flow reactor for vapor deposition of thin films | — | 1994-02-08 |