Issued Patents All Time
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7374636 | Method and apparatus for providing uniform plasma in a magnetic field enhanced plasma reactor | Keiji Horioka, Chun Yan, Taeho Shin, Roger Alan Lindley, Douglas H. Burns +4 more | 2008-05-20 |
| 7316199 | Method and apparatus for controlling the magnetic field intensity in a plasma enhanced semiconductor wafer processing chamber | Keiji Horioka, Chun Yan, Taeho Shin, Roger Alan Lindley, Qi Li +3 more | 2008-01-08 |