NI

Natsuko Ito

NE Nec: 11 patents #1,181 of 14,502Top 9%
RE Renesas Electronics: 3 patents #1,322 of 4,529Top 30%
NE Nec Electronics: 2 patents #384 of 1,789Top 25%
TL Tokyo Electron Limited: 2 patents #2,602 of 5,567Top 50%
Overall (All Time): #300,308 of 4,157,543Top 8%
16
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
8202394 Method of manufacturing semiconductor devices and semiconductor manufacturing apparatus Tsuyoshi Moriya, Fumihiko Uesugi 2012-06-19
8051799 Object-processing apparatus controlling production of particles in electric field or magnetic field Yousuke Itagaki, Fumihiko Uesugi 2011-11-08
7974067 Plasma processing apparatus and method of suppressing abnormal discharge therein Mitsuo Yasaka, Fumihiko Uesugi, Yousuke Itagaki 2011-07-05
7045465 Particle-removing method for a semiconductor device manufacturing apparatus Fumihiko Uesugi, Tsuyoshi Moriya 2006-05-16
7006682 Apparatus for monitoring particles and method of doing the same Tsuyoshi Moriya, Fumihiko Uesugi 2006-02-28
6737666 Apparatus and method for detecting an end point of a cleaning process Tsuyoshi Moriya, Fumihiko Uesugi, Yoshinori Kato, Masaru Aomori, Shuji Moriya +1 more 2004-05-18
6423176 Particle-removing apparatus for a semiconductor device manufacturing apparatus and method of removing particles Fumihiko Uesugi, Tsuyoshi Moriya 2002-07-23
6346425 Vapor-phase processing method capable of eliminating particle formation Tsuyoshi Moriya, Fumihiko Uesugi, Shuji Moriya, Masaru Aomori, Yoshinori Kato +1 more 2002-02-12
6306770 Method and apparatus for plasma etching Fumihiko Uesugi, Tsuyoshi Moriya 2001-10-23
6284049 Processing apparatus for fabricating LSI devices Fumihiko Uesugi 2001-09-04
6184489 Particle-removing apparatus for a semiconductor device manufacturing apparatus and method of removing particles Fumihiko Uesugi, Tsuyoshi Moriya 2001-02-06
6115120 System and method for detecting particles produced in a process chamber by scattering light Tsuyoshi Moriya, Fumihiko Uesugi 2000-09-05
6042650 Processing apparatus for fabricating LSI with protected beam damper Fumihiko Uesugi 2000-03-28
5870189 Particle monitor and particle-free recessing system with particle monitor Fumihiko Uesugi 1999-02-09
5861951 Particle monitoring instrument Fumihiko Uesugi 1999-01-19
5747991 Capacitance type acceleration sensor Hiroyuki Okada 1998-05-05