| 6573010 |
Method and apparatus for reducing incidental exposure by using a phase shifter with a variable regulator |
Hua-Yu Liu |
2003-06-03 |
| 6566019 |
Using double exposure effects during phase shifting to control line end shortening |
Hua-Yu Liu |
2003-05-20 |
| 5958635 |
Lithographic proximity correction through subset feature modification |
Alfred J. Reich, Hak-Lay Chuang, Paul G. Y. Tsui, Kevin Lucas, James N. Conner |
1999-09-28 |
| 5920487 |
Two dimensional lithographic proximity correction using DRC shape functions |
Alfred J. Reich, Warren D. Grobman, Bernard J. Roman, Kevin Lucas, Clyde Browning |
1999-07-06 |
| 5900340 |
One dimensional lithographic proximity correction using DRC shape functions |
Alfred J. Reich, Kevin Lucas, Warren D. Grobman, Bernard J. Roman |
1999-05-04 |
| 5849440 |
Process for producing and inspecting a lithographic reticle and fabricating semiconductor devices using same |
Kevin Lucas, Alfred J. Reich, Chong-Cheng Fu, James Morrow |
1998-12-15 |
| 5827625 |
Methods of designing a reticle and forming a semiconductor device therewith |
Kevin Lucas, Bernard J. Roman, Alfred J. Reich |
1998-10-27 |
