MS

Masahiro Sumiya

HH Hitachi High-Technologies: 35 patents #165 of 1,917Top 9%
HI Hitachi: 4 patents #8,942 of 28,497Top 35%
DE Denso: 2 patents #4,986 of 11,792Top 45%
NU National University Corporation Nagoya University: 2 patents #92 of 782Top 15%
Overall (All Time): #74,223 of 4,157,543Top 2%
41
Patents All Time

Issued Patents All Time

Showing 26–41 of 41 patents

Patent #TitleCo-InventorsDate
9941133 Plasma processing apparatus and plasma processing method Masaki Ishiguro, Shigeru Shirayone, Kazuyuki Ikenaga, Tomoyuki Tamura 2018-04-10
9915928 Availability prediction apparatus for electric power storage device Akira Ito, Junichirou Kanamori, Mitsuru Fujita, Tatsuya Suzuki, Shinkichi Inagaki +1 more 2018-03-13
9597975 Power supply system Akira Ito, Junichirou Kanamori, Mitsuru Fujita, Tatsuya Suzuki, Shinkichi Inagaki +1 more 2017-03-21
9496147 Plasma processing apparatus and plasma processing method Motohiro Tanaka 2016-11-15
8557709 Plasma processing apparatus and plasma processing method Motohiro Tanaka 2013-10-15
8236701 Plasma processing apparatus and plasma processing method Motohiro Tanaka, Kousa Hirota 2012-08-07
7771608 Plasma processing method and apparatus Tsutomu Iida 2010-08-10
7615132 Plasma processing apparatus having high frequency power source with sag compensation function and plasma processing method Naoki Yasui, Seiichi Watanabe, Hitoshi Tamura 2009-11-10
7585776 Dry etching method of insulating film Nobuyuki Negishi, Masatoshi Oyama 2009-09-08
7373899 Plasma processing apparatus using active matching Naoki Yasui, Seiichi Watanabe, Hitoshi Tamura 2008-05-20
7169255 Plasma processing apparatus Naoki Yasui, Hitoshi Tamura, Seiichi Watanabe 2007-01-30
7029594 Plasma processing method Naoki Yasui, Hitoshi Tamura, Seiichi Watanabe 2006-04-18
6875366 Plasma processing apparatus and method with controlled biasing functions Naoki Yasui, Seiichi Watanabe 2005-04-05
6806201 Plasma processing apparatus and method using active matching Naoki Yasui, Seiichi Watanabe, Hitoshi Tamura 2004-10-19
6777037 Plasma processing method and apparatus Hitoshi Tamura, Seiichi Watanabe 2004-08-17
5886473 Surface wave plasma processing apparatus Seiichi Watanabe, Muneo Furuse, Hitoshi Tamura 1999-03-23