Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5941758 | Method and apparatus for chemical-mechanical polishing | — | 1999-08-24 |
| 5053104 | Method of plasma etching a substrate with a gaseous organohalide compound | Suryadevara V. Babu, Joseph G. Hoffarth, Allan R. Knoll, Walter E. Mlynko, John F. Rembetski | 1991-10-01 |