GH

Ganesh Hegde

Samsung: 16 patents #8,525 of 75,807Top 15%
PF Purdue Research Foundation: 3 patents #492 of 3,174Top 20%
Overall (All Time): #234,241 of 4,157,543Top 6%
19
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
11586982 Electronic and atomic structure computation utilizing machine learning 2023-02-21
11537898 Generative structure-property inverse computational co-design of materials Harsono S. Simka 2022-12-27
11289419 Interconnects having long grains and methods of manufacturing the same Jorge A. Kittl, Harsono S. Simka 2022-03-29
11087055 Method of screening materials using forward conducting modes Harsono S. Simka, Chris Bowen 2021-08-10
11043454 Low resistivity interconnects with doped barrier layer for integrated circuits Harsono S. Simka 2021-06-22
10916513 Method and system for providing a reverse engineering resistant hardware embedded security module Harsono S. Simka, Joon Goo Hong, Rwik Sengupta, Mark S. Rodder 2021-02-09
10763207 Interconnects having long grains and methods of manufacturing the same Jorge A. Kittl, Harsono S. Simka 2020-09-01
10510886 Method of providing reacted metal source-drain stressors for tensile channel stress Jorge A. Kittl 2019-12-17
10510665 Low-k dielectric pore sealant and metal-diffusion barrier formed by doping and method for forming the same Mark S. Rodder, Jorge A. Kittl, Chris Bowen 2019-12-17
10381315 Method and system for providing a reverse-engineering resistant hardware embedded security module Harsono S. Simka, Joon Goo Hong, Rwik Sengupta, Mark S. Rodder 2019-08-13
10311179 Physical modeling of electronic devices/systems Gerhard Klimeck, Mykhailo Povolotskyi, Tillmann Kubis 2019-06-04
10297673 Methods of forming semiconductor devices including conductive contacts on source/drains Jorge A. Kittl, Rwik Sengupta, Borna J. Obradovic, Mark S. Rodder 2019-05-21
10283638 Structure and method to achieve large strain in NS without addition of stack-generated defects Jorge A. Kittl, Robert C. Bowen, Mark S. Rodder 2019-05-07
10061877 Physical modeling of electronic devices/systems Gerhard Klimeck, Mykhailo Povolotskyi, Tillmann Kubis 2018-08-28
9858365 Physical modeling of electronic devices/systems Gerhard Klimeck, Mykhailo Povolotskyi, Tillmann Kubis 2018-01-02
9831323 Structure and method to achieve compressively strained Si NS Jorge A. Kittl, Robert C. Bowen, Borna J. Obradovic, Mark S. Rodder 2017-11-28
9728502 Metal oxysilicate diffusion barriers for damascene metallization with low RC delays and methods for forming the same Mark S. Rodder, Rwik Sengupta, Chris Bowen 2017-08-08
9634140 Fabricating metal source-drain stressor in a MOS device channel Jorge A. Kittl, Mark S. Rodder 2017-04-25
9613907 Low resistivity damascene interconnect Mark S. Rodder, Jorge A. Kittl, Robert C. Bowen 2017-04-04