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Method of forming uniform features using photoresist |
Omar Eduardo Montero Camacho, Pei C. Chen, Cherngye Hwang, Eric Sun |
2009-07-14 |
| 7481312 |
Direct cooling pallet assembly for temperature stability for deep ion mill etch process |
Pei C. Chen, Jorge Goitia, Cherngye Hwang, Bigal Leung, Yongjian Sun |
2009-01-27 |
| 7296420 |
Direct cooling pallet tray for temperature stability for deep ion mill etch process |
Pei C. Chen, Jorge Goitia, Cherngye Hwang, Bigal Leung, Yongjian Sun |
2007-11-20 |
| 6132632 |
Method and apparatus for achieving etch rate uniformity in a reactive ion etcher |
David Emery Haney, Robert Huber, Cherngye Hwang, John W. Williams |
2000-10-17 |
| 6051099 |
Apparatus for achieving etch rate uniformity |
Raymond Bus-Kwoffie, Son V. Nguyen, Andrew C. Ting, John W. Williams |
2000-04-18 |
| 6027660 |
Method of etching ceramics of alumina/TiC with high density plasma |
Richard Hsiao, Cherngye Hwang, Son V. Nguyen |
2000-02-22 |
| 6001268 |
Reactive ion etching of alumina/TiC substrates |
Son V. Nguyen, Andrew C. Ting, Cherngye Hwang, Martin Straub, Gerd Dworschak |
1999-12-14 |
