| 7595234 |
Fabricating method for a metal oxide semiconductor transistor |
Po-Chao Tsao, Chang-Chi Huang, Ming-Tsung Chen, Yi-Yiing Chiang, Yu-Lan Chang +2 more |
2009-09-29 |
| 7544621 |
Method of removing a metal silicide layer on a gate electrode in a semiconductor manufacturing process and etching method |
Cheng-Kuen Chen, Wei-Tsun Shiau, WEN-FU YU |
2009-06-09 |
| 7491615 |
Method of fabricating strained-silicon transistors and strained-silicon CMOS transistors |
Hsin-Chih Tai, Chung-Ju Lee, Wei-Tsun Shiau |
2009-02-17 |
| 7338910 |
Method of fabricating semiconductor devices and method of removing a spacer |
Chung-Ju Lee, Wei-Tsun Shiau |
2008-03-04 |
| 7220647 |
Method of cleaning wafer and method of manufacturing gate structure |
Charlie Lee, Kuan-Yang Liao |
2007-05-22 |
| 7214988 |
Metal oxide semiconductor transistor |
Po-Chao Tsao, Chang-Chi Huang, Ming-Tsung Chen, Yi-Yiing Chiang, Yu-Lan Chang +2 more |
2007-05-08 |
| 7196019 |
Method of removing spacers and fabricating MOS transistor |
Charlie Lee, Kuan-Yang Liao |
2007-03-27 |
| 7172976 |
Extrusion-free wet cleaning process for copper-dual damascene structures |
— |
2007-02-06 |
| 7135400 |
Damascene process capable of avoiding via resist poisoning |
Wen-Liang Lien, Charlie Lee, Jain-Hon Chen |
2006-11-14 |
| 6794292 |
Extrusion-free wet cleaning process for copper-dual damascene structures |
— |
2004-09-21 |
| 6780761 |
Via-first dual damascene process |
Ming-Hsing Liu, Hsiao-Pang Chou, Ching-Piao Lin, Pei-Jen Wang |
2004-08-24 |
| 6767825 |
Etching process for forming damascene structure of the semiconductor |
— |
2004-07-27 |
| 6733597 |
Method of cleaning a dual damascene structure |
Sun-Chieh Chien |
2004-05-11 |
| 6692580 |
Method of cleaning a dual damascene structure |
Sun-Chieh Chien |
2004-02-17 |
| 6635565 |
Method of cleaning a dual damascene structure |
Chan-Lon Yang, Sun-Chieh Chien |
2003-10-21 |
| 6554002 |
Method for removing etching residues |
Cheng-Yuan Tsai, Chan-Lon Yang |
2003-04-29 |
| 6511916 |
Method for removing the photoresist layer in the damascene process |
— |
2003-01-28 |
| 6495472 |
Method for avoiding erosion of conductor structure during removing etching residues |
Chan-Lon Yang |
2002-12-17 |
| 6453915 |
Post polycide gate etching cleaning method |
Chan-Lon Yang |
2002-09-24 |
| 6440873 |
Post metal etch cleaning method |
Chan-Lon Yang |
2002-08-27 |
| 6303482 |
Method for cleaning the surface of a semiconductor wafer |
Chan-Lon Yang |
2001-10-16 |
| 6060415 |
Aligned molecular sieve crystals grown on anodic alumina membrane |
Kuei-Jung Chao, Han-Chang Shih, Tzeng-Guang Tsai |
2000-05-09 |