Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7892935 | Semiconductor process | Yi-Wei Chen, Chao-Ching Hsieh, Tsai-Fu Hsiao, Tsung-Yu Hung, Chun-Chieh Chang | 2011-02-22 |
| 7884028 | Method of removing material layer and remnant metal | Yi-Wei Chen, Chun-Chieh Chang, Tzung-Yu Hung, Chao-Ching Hsieh | 2011-02-08 |
| 7785972 | Method for fabricating semiconductor MOS device | Chao-Ching Hsieh, Yi-Wei Chen, Tzung-Yu Hung, Chun-Chieh Chang | 2010-08-31 |
| 7649263 | Semiconductor device | Chao-Ching Hsieh, Yi-Yiing Chiang, Yi-Wei Chen, Tzung-Yu Hung | 2010-01-19 |
| 7595234 | Fabricating method for a metal oxide semiconductor transistor | Po-Chao Tsao, Chang-Chi Huang, Ming-Tsung Chen, Yi-Yiing Chiang, Chung-Ju Lee +2 more | 2009-09-29 |
| 7595264 | Fabrication method of semiconductor device | Chao-Ching Hsieh, Yi-Yiing Chiang, Yi-Wei Chen, Tzung-Yu Hung | 2009-09-29 |
| 7572722 | Method of fabricating nickel silicide | Yi-Wei Chen, Chao-Ching Hsieh, Yi-Yiing Chiang, Tzung-Yu Hung, Po-Chao Tsao +2 more | 2009-08-11 |
| 7553762 | Method for forming metal silicide layer | Tzung-Yu Hung, Chun-Chieh Chang, Chao-Ching Hsieh, Yi-Wei Chen | 2009-06-30 |
| 7390754 | Method of forming a silicide | Chun-Chieh Chang, Tzung-Yu Hung, Chao-Ching Hsieh, Yi-Wei Chen | 2008-06-24 |
| 7385294 | Semiconductor device having nickel silicide and method of fabricating nickel silicide | Yi-Wei Chen, Chao-Ching Hsieh, Yi-Yiing Chiang, Tzung-Yu Hung, Po-Chao Tsao +2 more | 2008-06-10 |
| 7344978 | Fabrication method of semiconductor device | Chao-Ching Hsieh, Yi-Yiing Chiang, Yi-Wei Chen, Tzung-Yu Hung | 2008-03-18 |
| 7229920 | Method of fabricating metal silicide layer | Yi-Wei Chen, Tzung-Yu Hung, Yi-Yiing Chiang, Chao-Ching Hsieh | 2007-06-12 |
| 7214988 | Metal oxide semiconductor transistor | Po-Chao Tsao, Chang-Chi Huang, Ming-Tsung Chen, Yi-Yiing Chiang, Chung-Ju Lee +2 more | 2007-05-08 |