| 7892935 |
Semiconductor process |
Yi-Wei Chen, Chao-Ching Hsieh, Tsai-Fu Hsiao, Tsung-Yu Hung, Chun-Chieh Chang |
2011-02-22 |
$2,812,000 |
| 7884028 |
Method of removing material layer and remnant metal |
Yi-Wei Chen, Chun-Chieh Chang, Tzung-Yu Hung, Chao-Ching Hsieh |
2011-02-08 |
$1,968,000 |
| 7785972 |
Method for fabricating semiconductor MOS device |
Chao-Ching Hsieh, Yi-Wei Chen, Tzung-Yu Hung, Chun-Chieh Chang |
2010-08-31 |
$1,670,000 |
| 7649263 |
Semiconductor device |
Chao-Ching Hsieh, Yi-Yiing Chiang, Yi-Wei Chen, Tzung-Yu Hung |
2010-01-19 |
$2,673,000 |
| 7595234 |
Fabricating method for a metal oxide semiconductor transistor |
Po-Chao Tsao, Chang-Chi Huang, Ming-Tsung Chen, Yi-Yiing Chiang, Chung-Ju Lee +2 more |
2009-09-29 |
$5,677,000 |
| 7595264 |
Fabrication method of semiconductor device |
Chao-Ching Hsieh, Yi-Yiing Chiang, Yi-Wei Chen, Tzung-Yu Hung |
2009-09-29 |
$5,677,000 |
| 7572722 |
Method of fabricating nickel silicide |
Yi-Wei Chen, Chao-Ching Hsieh, Yi-Yiing Chiang, Tzung-Yu Hung, Po-Chao Tsao +2 more |
2009-08-11 |
$15,875,000 |
| 7553762 |
Method for forming metal silicide layer |
Tzung-Yu Hung, Chun-Chieh Chang, Chao-Ching Hsieh, Yi-Wei Chen |
2009-06-30 |
$3,125,000 |
| 7390754 |
Method of forming a silicide |
Chun-Chieh Chang, Tzung-Yu Hung, Chao-Ching Hsieh, Yi-Wei Chen |
2008-06-24 |
$1,609,000 |
| 7385294 |
Semiconductor device having nickel silicide and method of fabricating nickel silicide |
Yi-Wei Chen, Chao-Ching Hsieh, Yi-Yiing Chiang, Tzung-Yu Hung, Po-Chao Tsao +2 more |
2008-06-10 |
$1,091,000 |
| 7344978 |
Fabrication method of semiconductor device |
Chao-Ching Hsieh, Yi-Yiing Chiang, Yi-Wei Chen, Tzung-Yu Hung |
2008-03-18 |
$1,548,000 |
| 7229920 |
Method of fabricating metal silicide layer |
Yi-Wei Chen, Tzung-Yu Hung, Yi-Yiing Chiang, Chao-Ching Hsieh |
2007-06-12 |
$2,412,000 |
| 7214988 |
Metal oxide semiconductor transistor |
Po-Chao Tsao, Chang-Chi Huang, Ming-Tsung Chen, Yi-Yiing Chiang, Chung-Ju Lee +2 more |
2007-05-08 |
$1,078,000 |