| 7884028 |
Method of removing material layer and remnant metal |
Yi-Wei Chen, Chun-Chieh Chang, Yu-Lan Chang, Chao-Ching Hsieh |
2011-02-08 |
| 7785972 |
Method for fabricating semiconductor MOS device |
Yu-Lan Chang, Chao-Ching Hsieh, Yi-Wei Chen, Chun-Chieh Chang |
2010-08-31 |
| 7649263 |
Semiconductor device |
Yu-Lan Chang, Chao-Ching Hsieh, Yi-Yiing Chiang, Yi-Wei Chen |
2010-01-19 |
| 7595264 |
Fabrication method of semiconductor device |
Yu-Lan Chang, Chao-Ching Hsieh, Yi-Yiing Chiang, Yi-Wei Chen |
2009-09-29 |
| 7572722 |
Method of fabricating nickel silicide |
Yi-Wei Chen, Chao-Ching Hsieh, Yi-Yiing Chiang, Yu-Lan Chang, Po-Chao Tsao +2 more |
2009-08-11 |
| 7553762 |
Method for forming metal silicide layer |
Chun-Chieh Chang, Chao-Ching Hsieh, Yu-Lan Chang, Yi-Wei Chen |
2009-06-30 |
| 7482668 |
Semiconductor device |
Chao-Ching Hsieh, Chun-Chieh Chang |
2009-01-27 |
| 7390729 |
Method of fabricating a semiconductor device |
Chao-Ching Hsieh, Chun-Chieh Chang |
2008-06-24 |
| 7390754 |
Method of forming a silicide |
Chun-Chieh Chang, Chao-Ching Hsieh, Yi-Wei Chen, Yu-Lan Chang |
2008-06-24 |
| 7385294 |
Semiconductor device having nickel silicide and method of fabricating nickel silicide |
Yi-Wei Chen, Chao-Ching Hsieh, Yi-Yiing Chiang, Yu-Lan Chang, Po-Chao Tsao +2 more |
2008-06-10 |
| 7344978 |
Fabrication method of semiconductor device |
Yu-Lan Chang, Chao-Ching Hsieh, Yi-Yiing Chiang, Yi-Wei Chen |
2008-03-18 |
| 7229920 |
Method of fabricating metal silicide layer |
Yi-Wei Chen, Yi-Yiing Chiang, Chao-Ching Hsieh, Yu-Lan Chang |
2007-06-12 |
| 6849541 |
Method of fabricating a dual damascene copper wire |
Shao-Chung Hu, Yu-Ru Yang, Chien-Chung Huang |
2005-02-01 |