CF

Carlos A. Fonseca

IBM: 17 patents #6,502 of 70,183Top 10%
TL Tokyo Electron Limited: 15 patents #423 of 5,567Top 8%
📍 Lagrangeville, NY: #21 of 200 inventorsTop 15%
🗺 New York: #3,677 of 115,490 inventorsTop 4%
Overall (All Time): #110,162 of 4,157,543Top 3%
32
Patents All Time

Issued Patents All Time

Showing 26–32 of 32 patents

Patent #TitleCo-InventorsDate
6927005 Alternating phase shift mask design with optimized phase shapes Lars Liebmann, Ioana Graur, Mark A. Lavin 2005-08-09
6901576 Phase-width balanced alternating phase shift mask design Lars Liebmann, Ioana Graur 2005-05-31
6824932 Self-aligned alternating phase shift mask patterning process Scott Bukofsky, Michael S. Hibbs, Lars Liebmann 2004-11-30
6795961 Priority coloring for VLSI designs Lars Liebmann, Ioana Graur, Young Ouk Kim 2004-09-21
6777147 Method for evaluating the effects of multiple exposure processes in lithography Scott Bukofsky, Kafai Lai 2004-08-17
6757886 Alternating phase shift mask design with optimized phase shapes Lars Liebmann, Ioana Graur, Mark A. Lavin 2004-06-29
6609245 Priority coloring for VLSI designs Lars Liebmann, Ioana Graur, Young Ouk Kim 2003-08-19