Been-Jon Woo — 17 Patents at Intel

Been-Jon Woo has been granted 17 US patents while listed as an inventor at Intel. The first was granted in 1988 and the most recent in December 2009. Been-Jon Woo ranks #263,971 of 4,157,543 US inventors in our database (top 6.3%). Patent records list Been-Jon Woo in Saratoga, CA, US.

Issued Patents All Time

Showing 1–17 of 17 patents

Patent #	Title	Co-Inventors	Date	Approx Value ⓘ
7632736	Self-aligned contact formation utilizing sacrificial polysilicon	Max Wei	2009-12-15	$24,562,000
7465625	Flash memory cell having reduced floating gate to floating gate coupling	Yudong Kim, Albert Fazio	2008-12-16
7348618	Flash memory cell having reduced floating gate to floating gate coupling	Yudong Kim, Albert Fazio	2008-03-25	$11,219,000
7015149	Simplified dual damascene process	—	2006-03-21
5470772	Silicidation method for contactless EPROM related devices	—	1995-11-28	$29,998,000
5229631	Erase performance improvement via dual floating gate processing	—	1993-07-20	$88,009,000
5210047	Process for fabricating a flash EPROM having reduced cell size	Gregory E. Atwood, Stefan Lai, T. C. Ong	1993-05-11
5196361	Method of making source junction breakdown for devices with source-side erasing	Tong-Chern Ong	1993-03-23	$68,526,000
5147813	Erase performance improvement via dual floating gate processing	—	1992-09-15	$37,767,000
5102814	Method for improving device scalability of buried bit line flash EPROM devices having short reoxidation beaks and shallower junctions	—	1992-04-07	$28,745,000
5077230	Method for improving erase characteristics of buried bit line flash EPROM devices by use of a thin nitride layer formed during field oxide growth	Mark A. Holler	1991-12-31	$48,446,000
5075245	Method for improving erase characteristics of buried bit line flash EPROM devices without using sacrificial oxide growth and removal steps	Mark A. Holler	1991-12-24	$18,350,000
4833099	Tungsten-silicide reoxidation process including annealing in pure nitrogen and subsequent oxidation in oxygen	—	1989-05-23	$50,574,000
4784965	Source drain doping technique	Mark A. Holler, Ender Hokeler, Sandra S. Lee	1988-11-15	$9,472,000
4774201	Tungsten-silicide reoxidation technique using a CVD oxide cap	Wei-Jen Lo	1988-09-27	$58,029,000
4757026	Source drain doping technique	Mark A. Holler, Ender Hokelek, Sandra S. Lee	1988-07-12	$34,993,000
4728617	Method of fabricating a MOSFET with graded source and drain regions	Mark A. Holler, Ender Hokelek, Sandra S. Lee	1988-03-01	$30,751,000

Been-Jon Woo — 17 Patents

Issued Patents All Time

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