Issued Patents All Time
Showing 1–21 of 21 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8873280 | Spin transfer torque random access memory | Tzung-Han Lee, Chung-Lin Huang | 2014-10-28 |
| 8779494 | High-k metal gate random access memory | Tzung-Han Lee, Chung-Lin Huang | 2014-07-15 |
| 8703575 | Method of forming isolation area and structure thereof | Tzung-Han Lee, Chung-Lin Huang | 2014-04-22 |
| 8703562 | Manufacturing method of random access memory | Tzung-Han Lee, Chung-Lin Huang | 2014-04-22 |
| 8604620 | Semiconductor structure having lateral through silicon via | Tzung-Han Lee, Chung-Lin Huang, Dah-Wei Liu | 2013-12-10 |
| 8486801 | Fabricating method of DRAM structure | Tzung-Han Lee, Chung-Lin Huang | 2013-07-16 |
| 8471320 | Memory layout structure | Tzung-Han Lee, Chung-Lin Huang | 2013-06-25 |
| 8373220 | NAND type flash memory for increasing data read/write reliability | Tzung-Han Lee, Chung-Lin Huang | 2013-02-12 |
| 8298892 | Fabricating method of insulator | Tzung-Han Lee, Chung-Lin Huang | 2012-10-30 |
| 6696227 | Shift multi-exposure method | Chung-Wei Hsu | 2004-02-24 |
| 6551520 | Exhausting method and means in a dry etching apparatus | — | 2003-04-22 |
| 6451706 | Attenuation of reflecting lights by surface treatment | Yang Pan, Qun Ying Lin, Mei Sheng Zhou | 2002-09-17 |
| 6139251 | Stepper alignment method and apparatus | — | 2000-10-31 |
| 5863307 | Method and slurry composition for chemical-mechanical polish (CMP) planarizing of copper containing conductor layers | Mei Sheng Zhou | 1999-01-26 |
| 5857127 | Apparatus for the photoresist development process of an integrated circuit fabrication | — | 1999-01-05 |
| 5795699 | Langmuir-blodgett (LB) films as ARC and adhesion promoters for patterning of semiconductor devices | Mei Sheng Zhou | 1998-08-18 |
| 5734594 | Method and system for enhancement of wafer alignment accuracy | Zadig Cheung-Ching Lam | 1998-03-31 |
| 5728493 | Antireflection mask for contact hole opening | Chet Ping Lim | 1998-03-17 |
| 5582679 | Enhanced metal etch process | Liu Lianjun | 1996-12-10 |
| 5567271 | Oxygen reactive ion etch (RIE) plasma method for removing oxidized organic residues from semiconductor substrates | Chet Ping Lim, Sheau-Tan Loong | 1996-10-22 |
| 5496666 | Contact hole mask for semiconductor fabrication | Chun Hoe YIK | 1996-03-05 |