Issued Patents All Time
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5728493 | Antireflection mask for contact hole opening | Ron Fu Chu | 1998-03-17 |
| 5567271 | Oxygen reactive ion etch (RIE) plasma method for removing oxidized organic residues from semiconductor substrates | Ron Fu Chu, Sheau-Tan Loong | 1996-10-22 |