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Method for fabricating a nitrided silicon-oxide gate dielectric |
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CMOS transistor with a polysilicon gate electrode having varying grain size |
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Method for fabricating a nitrided silicon-oxide gate dielectric |
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Method of reducing polysilicon depletion in a polysilicon gate electrode by depositing polysilicon of varying grain size |
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Thermal nitrogen distribution method to improve uniformity of highly doped ultra-thin gate capacitors |
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