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Reflective mask blank and method of manufacturing a reflective mask |
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2016-01-05 |
| 9075314 |
Photomask blank, photomask, and method for manufacturing photomask blank |
Hiroyuki Iwashita, Hiroaki Shishido, Atsushi Kominato, Masahiro Hashimoto |
2015-07-07 |
| 8709685 |
Reflective mask blank and method of manufacturing a reflective mask |
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2014-04-29 |
| 8546047 |
Reflective mask blank and method of manufacturing a reflective mask |
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2013-10-01 |
| 8512916 |
Photomask blank, photomask, and method for manufacturing photomask blank |
Hiroyuki Iwashita, Hiroaki Shishido, Atsushi Kominato, Masahiro Hashimoto |
2013-08-20 |
| 8389184 |
Reflective mask blank and method of manufacturing a reflective mask |
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2013-03-05 |
| 8329361 |
Reflective mask blank, method of manufacturing a reflective mask blank and method of manufacturing a reflective mask |
— |
2012-12-11 |
| 8081384 |
Multilayer reflective film coated substrate, manufacturing method thereof, reflective mask blank, and reflective mask |
Takeyuki Yamada, Akira Ikeda |
2011-12-20 |
| 8021807 |
Reflective mask blank and method of producing the same, and method of producing a reflective mask |
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2011-09-20 |
| 7981573 |
Reflective mask blank, reflective mask and methods of producing the mask blank and the mask |
Shinichi Ishibashi, Tsutomu Shoki, Yuki Shiota, Mitsuhiro Kureishi |
2011-07-19 |
| 7804648 |
Multilayer reflective film coated substrate, manufacturing method thereof, reflective mask blank, and reflective mask |
Takeyuki Yamada, Akira Ikeda |
2010-09-28 |
| 7700245 |
Reflective mask blank, reflective mask, and method of manufacturing semiconductor device |
Tsutomu Shoki |
2010-04-20 |
| 7390596 |
Reflection type mask blank and reflection type mask and production methods for them |
Shinichi Ishibashi, Tsutomu Shoki, Yuki Shiota, Mitsuhiro Kureishi |
2008-06-24 |
| 7056627 |
Method of manufacturing a reflection type mask blank and method of manufacturing a reflection type mask |
Tsutomu Shoki, Takeru Kinoshita |
2006-06-06 |
| 6749973 |
Reflection type mask blank for EUV exposure and reflection type mask for EUV exposure as well as method of producing the mask |
Tsutomu Shoki |
2004-06-15 |
| 6737201 |
Substrate with multilayer film, reflection type mask blank for exposure, reflection type mask for exposure and production method thereof as well as production method of semiconductor device |
Tsutomu Shoki |
2004-05-18 |