Issued Patents All Time
Showing 1–16 of 16 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9229315 | Reflective mask blank and method of manufacturing a reflective mask | — | 2016-01-05 |
| 9075314 | Photomask blank, photomask, and method for manufacturing photomask blank | Hiroyuki Iwashita, Hiroaki Shishido, Atsushi Kominato, Masahiro Hashimoto | 2015-07-07 |
| 8709685 | Reflective mask blank and method of manufacturing a reflective mask | — | 2014-04-29 |
| 8546047 | Reflective mask blank and method of manufacturing a reflective mask | — | 2013-10-01 |
| 8512916 | Photomask blank, photomask, and method for manufacturing photomask blank | Hiroyuki Iwashita, Hiroaki Shishido, Atsushi Kominato, Masahiro Hashimoto | 2013-08-20 |
| 8389184 | Reflective mask blank and method of manufacturing a reflective mask | — | 2013-03-05 |
| 8329361 | Reflective mask blank, method of manufacturing a reflective mask blank and method of manufacturing a reflective mask | — | 2012-12-11 |
| 8081384 | Multilayer reflective film coated substrate, manufacturing method thereof, reflective mask blank, and reflective mask | Takeyuki Yamada, Akira Ikeda | 2011-12-20 |
| 8021807 | Reflective mask blank and method of producing the same, and method of producing a reflective mask | — | 2011-09-20 |
| 7981573 | Reflective mask blank, reflective mask and methods of producing the mask blank and the mask | Shinichi Ishibashi, Tsutomu Shoki, Yuki Shiota, Mitsuhiro Kureishi | 2011-07-19 |
| 7804648 | Multilayer reflective film coated substrate, manufacturing method thereof, reflective mask blank, and reflective mask | Takeyuki Yamada, Akira Ikeda | 2010-09-28 |
| 7700245 | Reflective mask blank, reflective mask, and method of manufacturing semiconductor device | Tsutomu Shoki | 2010-04-20 |
| 7390596 | Reflection type mask blank and reflection type mask and production methods for them | Shinichi Ishibashi, Tsutomu Shoki, Yuki Shiota, Mitsuhiro Kureishi | 2008-06-24 |
| 7056627 | Method of manufacturing a reflection type mask blank and method of manufacturing a reflection type mask | Tsutomu Shoki, Takeru Kinoshita | 2006-06-06 |
| 6749973 | Reflection type mask blank for EUV exposure and reflection type mask for EUV exposure as well as method of producing the mask | Tsutomu Shoki | 2004-06-15 |
| 6737201 | Substrate with multilayer film, reflection type mask blank for exposure, reflection type mask for exposure and production method thereof as well as production method of semiconductor device | Tsutomu Shoki | 2004-05-18 |