Issued Patents All Time
Showing 25 most recent of 40 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8440388 | Method to restore hydrophobicity in dielectric films and materials | Michael Thomas, James Drage | 2013-05-14 |
| 7858294 | Method to restore hydrophobicity in dielectric films and materials | Michael Thomas, James Drage | 2010-12-28 |
| 7678462 | Spin-on-glass anti-reflective coatings for photolithography | Joseph Kennedy, Teresa Baldwin, Richard Spear | 2010-03-16 |
| 7504470 | Polyorganosiloxane dielectric materials | Juha Rantala, Jyri Paulasaari, Janne Kylmä, Turo T. Törmänen, Jarkko J. Pietikainen +1 more | 2009-03-17 |
| 7029826 | Method to restore hydrophobicity in dielectric films and materials | Michael Thomas, James Drage | 2006-04-18 |
| 7011889 | Organosiloxanes | William B. Bedwell, Roger Leung, Nancy Iwamoto, Jan Nedbal, Songyuan Xie +2 more | 2006-03-14 |
| 7012125 | Spin-on-glass anti-reflective coatings for photolithography | Joseph Kennedy, Teresa Baldwin, Richard Spear | 2006-03-14 |
| 6969753 | Spin-on-glass anti-reflective coatings for photolithography | Teresa Baldwin, Joseph Kennedy, Richard Spear | 2005-11-29 |
| 6967172 | Colloidal silica composite films for premetal dielectric applications | Roger Leung, Denis Endisch, Songyuan Xie, Yanpei Deng | 2005-11-22 |
| 6962727 | Organosiloxanes | William B. Bedwell, Roger Leung, Nancy Iwamoto, Jan Nedbal, Songyuan Xie +2 more | 2005-11-08 |
| 6956097 | Spin-on-glass anti-reflective coatings for photolithography | Joseph Kennedy, Teresa Baldwin, Richard Spear | 2005-10-18 |
| 6838124 | Deposition of fluorosilsesquioxane films | — | 2005-01-04 |
| 6824879 | Spin-on-glass anti-reflective coatings for photolithography | Teresa Baldwin, Joseph Kennedy, Richard Spear | 2004-11-30 |
| 6743856 | Synthesis of siloxane resins | Lisa Figge, Scott Lefferts | 2004-06-01 |
| 6723780 | Novolac polymer planarization films with high temperature stability | Todd Krajewski, Richard Spear | 2004-04-20 |
| 6653718 | Dielectric films for narrow gap-fill applications | Roger Leung, Denis Endisch, Songyuan Xie, Yanpei Deng | 2003-11-25 |
| 6517951 | Novolac polymer planarization films with high temperature stability | Todd Krajewski, Richard Spear | 2003-02-11 |
| 6512071 | Organohydridosiloxane resins with high organic content | Scott Lefferts, Lisa Figge | 2003-01-28 |
| 6506831 | Novolac polymer planarization films with high temperature stability | Todd Krajewski, Richard Spear | 2003-01-14 |
| 6506497 | Spin-on-glass anti-reflective coatings for photolithography | Joseph Kennedy, Teresa Baldwin, Richard Spear | 2003-01-14 |
| 6506441 | Novolac polymer planarization films with high temperature stability | Todd Krajewski, Richard Spear | 2003-01-14 |
| 6472076 | Deposition of organosilsesquioxane films | — | 2002-10-29 |
| 6444495 | Dielectric films for narrow gap-fill applications | Roger Leung, Denis Endisch, Songyuan Xie, Yanpei Deng | 2002-09-03 |
| 6440550 | Deposition of fluorosilsesquioxane films | — | 2002-08-27 |
| 6365765 | Spin-on-glass anti-reflective coatings for photolithography | Teresa Baldwin, Joseph Kennedy, Richard Spear | 2002-04-02 |