Issued Patents All Time
Showing 1–25 of 55 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8992806 | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof | Bo Li, Joseph Kennedy, Nancy Iwamoto, Mark A. Fradkin, Makarem A. Hussein +2 more | 2015-03-31 |
| 8975170 | Dopant ink compositions for forming doped regions in semiconductor substrates, and methods for fabricating dopant ink compositions | Ligui Zhou, Richard Spear, Wenya Fan, Helen Xu, Lea M. Metin +1 more | 2015-03-10 |
| 8518170 | Boron-comprising inks for forming boron-doped regions in semiconductor substrates using non-contact printing processes and methods for fabricating such boron-comprising inks | De-Ling Zhou, Wenya Fan | 2013-08-27 |
| 8475666 | Method for making toughening agent materials | Teresa Ramos, Robert Richard Roth, Anil Bhanap, Paul Apen, Denis Endisch +3 more | 2013-07-02 |
| 8324089 | Compositions for forming doped regions in semiconductor substrates, methods for fabricating such compositions, and methods for forming doped regions using such compositions | Wenya Fan, Jan Nedbal | 2012-12-04 |
| 8053159 | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof | Bo Li, Joseph Kennedy, Nancy Iwamoto, Victor Lu, Mark A. Fradkin +2 more | 2011-11-08 |
| 7951696 | Methods for simultaneously forming N-type and P-type doped regions using non-contact printing processes | Anil Bhanap, Zhe Ding, Nicole Rutherford, Wenya Fan | 2011-05-31 |
| 7915159 | Treating agent materials | Anil Bhanap, Boris Korolev, Beth Munoz | 2011-03-29 |
| 7820532 | Methods for simultaneously forming doped regions having different conductivity-determining type element profiles | Nicole Rutherford, Anil Bhanap | 2010-10-26 |
| 7709371 | Repairing damage to low-k dielectric materials using silylating agents | Anil Bhanap, Teresa Ramos, Nancy Iwamoto, Ananth Naman | 2010-05-04 |
| 7381441 | Low metal porous silica dielectric for integral circuit applications | Eric Deng, Songyuan Xie, Victor Lu | 2008-06-03 |
| 7381442 | Porogens for porous silica dielectric for integral circuit applications | Victor Lu, Eric Deng, Songyuan Xie | 2008-06-03 |
| 7307137 | Low dielectric constant materials and methods of preparation thereof | Kreisler Lau, Feng Q. Liu, Paul Apen, Boris Korolev, Emma Brouk +2 more | 2007-12-11 |
| 7148263 | Hybrid inorganic/organic low k dielectric films with improved mechanical strength | Bo Li, Victor Lu, Paul Apen | 2006-12-12 |
| 7011889 | Organosiloxanes | William B. Bedwell, Nigel Hacker, Nancy Iwamoto, Jan Nedbal, Songyuan Xie +2 more | 2006-03-14 |
| 6967172 | Colloidal silica composite films for premetal dielectric applications | Denis Endisch, Songyuan Xie, Nigel Hacker, Yanpei Deng | 2005-11-22 |
| 6962727 | Organosiloxanes | William B. Bedwell, Nigel Hacker, Nancy Iwamoto, Jan Nedbal, Songyuan Xie +2 more | 2005-11-08 |
| 6890641 | Low dielectric materials and methods of producing same | Shyama Mukherjee, Kreisler Lau | 2005-05-10 |
| 6849696 | Low dielectric constant organic dielectrics based on cage-like structures | Kreisler Lau, Feng Q. Liu, Boris Korolev, Emma Brouk | 2005-02-01 |
| 6797777 | Low dielectric constant organic dielectrics based on cage-like structures | Kreisler Lau, Feng Q. Liu, Boris Korolev, Emma Brouk, Rusian Zherebin | 2004-09-28 |
| 6653718 | Dielectric films for narrow gap-fill applications | Denis Endisch, Songyuan Xie, Nigel Hacker, Yanpei Deng | 2003-11-25 |
| 6627669 | Low dielectric materials and methods of producing same | Shyama Mukherjee, Kreisler Lau | 2003-09-30 |
| 6509415 | Low dielectric constant organic dielectrics based on cage-like structures | Kreisler Lau, Feng Q. Liu, Boris Korolev, Emma Brouk, Rusian Zherebin | 2003-01-21 |
| 6444495 | Dielectric films for narrow gap-fill applications | Denis Endisch, Songyuan Xie, Nigel Hacker, Yanpei Deng | 2002-09-03 |
| 6444715 | Low dielectric materials and methods of producing same | Shyama Mukherjee, Kreisler Lau | 2002-09-03 |