Issued Patents All Time
Showing 76–98 of 98 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5612304 | Redox reagent-containing post-etch residue cleaning composition | Rodney J. Hurditch | 1997-03-18 |
| 5597678 | Non-corrosive photoresist stripper composition | Donald F. Perry, Taishih Maw | 1997-01-28 |
| 5565304 | Chemically amplified radiation-sensitive composition used in a process for fabricating a semiconductor device | — | 1996-10-15 |
| 5561105 | Chelating reagent containing photoresist stripper composition | — | 1996-10-01 |
| 5550004 | Chemically amplified radiation-sensitive composition | — | 1996-08-27 |
| 5545353 | Non-corrosive photoresist stripper composition | Taishih Maw | 1996-08-13 |
| 5507978 | Novolak containing photoresist stripper composition | — | 1996-04-16 |
| 5472830 | Non-corrosion photoresist stripping composition | — | 1995-12-05 |
| 5446125 | Method for removing metal impurities from resist components | Edward A. Fitzgerald, IV, Lawrence Ferreira | 1995-08-29 |
| 5446126 | Method for removing metal impurities from resist components | — | 1995-08-29 |
| 5378802 | Method for removing impurities from resist components and novolak resins | — | 1995-01-03 |
| 5340687 | Chemically modified hydroxy styrene polymer resins and their use in photoactive resist compositions wherein the modifying agent is monomethylol phenol | — | 1994-08-23 |
| 5302688 | Selected block phenolic oligomers and their use in phenolic resin compositions and in radiation-sensitive resist compositions | Alfred T. Jeffries, III, Andrew J. Blakeney, Sobhy Tadros | 1994-04-12 |
| 5300628 | Selected chelate resins and their use to remove multivalent metal impurities from resist components | — | 1994-04-05 |
| 5234795 | Process of developing an image-wise exposed resist-coated substrate | Alfred T. Jeffries, III, Andrew J. Blakeney, Sobhy Tadros | 1993-08-10 |
| 5235022 | Selected block copolymer novolak binder resins | Alfred T. Jeffries, III, Andrew J. Blakeney, Sobhy Tadros | 1993-08-10 |
| 5232819 | Selected block phenolic oligomers and their use in phenolic resin compositions and in radiation-sensitive resist compositions | Alfred T. Jeffries, III, Andrew J. Blakeney, Sobhy Tadros | 1993-08-03 |
| 5196289 | Selected block phenolic oligomers and their use in radiation-sensitive resist compositions | Alfred T. Jeffries, III, Andrew J. Blakeney, Sobhy Tadros | 1993-03-23 |
| 5188921 | Selected block copolymer novolak binder resins in radiation-sensitive resist compositions | Alfred T. Jeffries, III, Andrew J. Blakeney, Sobhy Tadros | 1993-02-23 |
| 4894730 | Manually sweeping contact sensitive copier with image data memory | Nikio Yanagawa, Hiroshi Okumura | 1990-01-16 |
| 4677818 | Composite rope and manufacture thereof | Tadaaki Sawafuji | 1987-07-07 |
| 4661896 | High voltage power supply system including inverter controller | Hiroyoshi Kobayashi | 1987-04-28 |
| 4476003 | Chemical anchoring of organic conducting polymers to semiconducting surfaces | Arthur J. Frank | 1984-10-09 |