Issued Patents All Time
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6551749 | Developer and method for forming resist pattern and photomask produced by use thereof | Eiichi Hoshino, Keiji Watanabe | 2003-04-22 |
| 6465137 | Resist composition and pattern forming process | Keiji Watanabe, Miwa Kozawa, Ei Yano, Takahisa Namiki, Koji Nozaki +4 more | 2002-10-15 |
| 6143473 | Film patterning method utilizing post-development residue remover | Eiichi Hoshino, Masahiko Uraguchi, Yuuichi Yamamoto, Yukihiro Sato | 2000-11-07 |