MK

Miwa Kozawa

Fujitsu Limited: 46 patents #330 of 24,456Top 2%
Overall (All Time): #63,383 of 4,157,543Top 2%
46
Patents All Time

Issued Patents All Time

Showing 26–46 of 46 patents

Patent #TitleCo-InventorsDate
7550248 Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for manufacturing the same Takahisa Namiki, Koji Nozaki 2009-06-23
7488569 Negative resist composition, a method for forming a resist pattern thereof, and a method for fabricating a semiconductor device Koji Nozaki, Keiji Watanabe, Ei Yano 2009-02-10
7452657 Resist composition, method of forming resist pattern, semiconductor device and method of manufacturing thereof Takahisa Namiki, Koji Nozaki 2008-11-18
7439010 Alkali-soluble siloxane polymer, positive type resist composition, resist pattern, process for forming the same, electronic device and process for manufacturing the same Keiji Watanabe, Shoichi Suda, Fumi Yamaguchi, Isao Yahagi, Michitaka Morikawa 2008-10-21
7416837 Resist pattern-improving material and a method for preparing a resist pattern by using the same Koji Nozaki 2008-08-26
7364829 Resist pattern thickening material, process for forming resist pattern, and process for manufacturing semiconductor device Koji Nozaki, Takahisa Namiki, Junichi Kon 2008-04-29
7361448 Resist pattern thickening material and process for forming the same, and semiconductor device and process for manufacturing the same Koji Nozaki, Takahisa Namiki 2008-04-22
7338750 Resist pattern thickness reducing material, resist pattern and process for forming thereof, and semiconductor device and process for manufacturing thereof Koji Nozaki, Takahisa Namiki, Junichi Kon 2008-03-04
7189783 Resist pattern thickening material, resist pattern and forming process thereof, and semiconductor device and manufacturing process thereof Koji Nozaki, Takahisa Namiki, Junichi Kon, Ei Yano 2007-03-13
7144968 Silicon-containing polymer, process for its production, resist composition employing it, pattern-forming method and electronic device fabrication method Keiji Watanabe, Ei Yano 2006-12-05
7122288 Negative resist composition, a method for forming a resist pattern thereof, and a method for fabricating a semiconductor device Koji Nozaki, Keiji Watanabe, Ei Yano 2006-10-17
6949324 Alkali-soluble siloxane polymer, positive type resist composition, resist pattern, process for forming the same, electronic device and process for manufacturing the same Keiji Watanabe, Shoichi Suda, Fumi Yamaguchi, Isao Yahagi, Michitaka Morikawa 2005-09-27
6794112 Negative resist composition, method for the formation of resist patterns and process for the production of electronic devices Koji Nozaki, Takahisa Namiki, Ei Yano, Junichi Kon 2004-09-21
6794113 Negative resist composition, method for the formation of resist patterns and process for the production of electronic devices Koji Nozaki, Takahisa Namiki, Ei Yano, Junichi Kon 2004-09-21
6787288 Negative resist composition, method for the formation of resist patterns and process for the production of electronic devices Koji Nozaki, Takahisa Namiki, Ei Yano, Junichi Kon 2004-09-07
6773867 Negative resist composition, method for the formation of resist patterns and process for the production of electronic devices Koji Nozaki, Takahisa Namiki, Ei Yano, Junichi Kon 2004-08-10
6770417 Negative resist composition, process for forming resist patterns, and process for manufacturing electron device Koji Nozaki, Ei Yano 2004-08-03
6541077 Silicon-containing polymer, process for its production, resist composition employing it, pattern-forming method and electronic device fabrication method Keiji Watanabe, Ei Yano 2003-04-01
6506534 Negative resist composition, method for the formation of resist patterns and process for the production of electronic devices Koji Nozaki, Takahisa Namiki, Ei Yano, Junichi Kon 2003-01-14
6465137 Resist composition and pattern forming process Keiji Watanabe, Ei Yano, Takahisa Namiki, Koji Nozaki, Junichi Kon +4 more 2002-10-15
6342562 Silicon-containing polymer, process for its production, resist composition employing it, pattern-forming method and electronic device fabrication method Keiji Watanabe, Ei Yano 2002-01-29