Issued Patents All Time
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5976973 | Method of making a semiconductor device having planarized insulating layer | Koichiro Ohira, Katsuyuki Karakawa, Kazutoshi Izumi | 1999-11-02 |
| 5763005 | Method for forming multilayer insulating film of semiconductor device | Yuji Furumura, Hidetoshi Nishio | 1998-06-09 |
| 5620526 | In-situ cleaning of plasma treatment chamber | Hirofumi Watatani, Shoji Okuda, Junya Nakahira, Hideaki Kikuchi | 1997-04-15 |
| 5506443 | Multilayer insulating film of semiconductor device and method for forming the film | Yuji Furumura, Hidetoshi Nishio | 1996-04-09 |
| 5310452 | Plasma process apparatus and plasma processing method | Kiyoshi Ooiwa | 1994-05-10 |
| 5231057 | Method of depositing insulating layer on underlying layer using plasma-assisted CVD process using pulse-modulated plasma | Junya Nakahira, Yuji Furumura | 1993-07-27 |
| 5183777 | Method of forming shallow junctions | Michiko Takei | 1993-02-02 |
| 5160397 | Plasma process apparatus and plasma processing method | Kiyoshi Ooiwa | 1992-11-03 |
| 5103285 | Silicon carbide barrier between silicon substrate and metal layer | Yuji Furumura, Fumitake Mieno, Takashi Eshita, Kikuo Itoh | 1992-04-07 |
| 4891118 | Plasma processing apparatus | Kiyoshi Ooiwa | 1990-01-02 |