TO

Tadahiro Ohmi

FI Fujikin Incorporated: 86 patents #6 of 318Top 2%
TL Tokyo Electron Limited: 80 patents #18 of 5,567Top 1%
NU National University Corporation Tohoku University: 48 patents #1 of 170Top 1%
TU Tohoku University: 46 patents #4 of 1,680Top 1%
Canon: 45 patents #884 of 19,416Top 5%
TO Tadahiro Ohmi: 32 patents #1 of 65Top 2%
AC Alps Electric Co.: 25 patents #34 of 2,177Top 2%
ZS Zaidan Hojin Handotai Kenkyu Shinkokai: 17 patents #2 of 34Top 6%
Sharp Kabushiki Kaisha: 14 patents #1,181 of 10,731Top 15%
NS Nippon Sanso: 11 patents #10 of 243Top 5%
FI Frontec Incorporated: 10 patents #3 of 40Top 8%
SC Stella Chemifa: 8 patents #7 of 80Top 9%
HS Handotai Kenkyu Shinkokai: 7 patents #2 of 4Top 50%
OR Organo: 7 patents #10 of 167Top 6%
TK Takasago Netsugaku Kogyo Kabushiki Kaisha: 7 patents #1 of 13Top 8%
HC Hashimoto Chemical: 6 patents #2 of 14Top 15%
SC Shin-Etsu Handotai Co.: 6 patents #126 of 679Top 20%
SR Semiconductor Research: 5 patents #2 of 22Top 10%
Rohm Co.: 5 patents #568 of 2,292Top 25%
TS Tadashi Shibata: 5 patents #1 of 7Top 15%
MC Mitsubishi Chemical: 5 patents #358 of 3,022Top 15%
IA I.F. Associates: 4 patents #1 of 16Top 7%
TA Taisei: 4 patents #11 of 224Top 5%
NI Nippon Valqua Industries: 4 patents #8 of 83Top 10%
HC Hashimoto Chemical Industries Co.: 4 patents #1 of 5Top 20%
OK Osaka Sanso Kogyo: 4 patents #4 of 46Top 9%
DC Daisho Denshi Co.: 4 patents #1 of 12Top 9%
TS Taiyo Nippon Sanso: 3 patents #31 of 203Top 20%
MW Motoyama Eng. Works: 3 patents #2 of 13Top 20%
ZE Zeon: 3 patents #220 of 734Top 30%
SE Seiko Epson: 3 patents #3,864 of 7,774Top 50%
YA Yazaki: 3 patents #1,239 of 3,427Top 40%
MC Mitsubishi Aluminum Co.: 3 patents #21 of 121Top 20%
AD Advantest: 3 patents #330 of 1,193Top 30%
HO Horiba: 2 patents #199 of 604Top 35%
FC Fuji Electric Co.: 2 patents #952 of 2,643Top 40%
Fujitsu Limited: 2 patents #10,930 of 24,456Top 45%
FV Future Vision: 2 patents #4 of 35Top 15%
KS Kabushiki Kaisha Watanabe Shoko: 2 patents #7 of 17Top 45%
Nichia: 2 patents #761 of 1,531Top 50%
PR Pretechnology: 2 patents #3 of 10Top 30%
SC Semiconductor Technology Academic Research Center: 2 patents #50 of 254Top 20%
SC Shinko Pantec Co.: 2 patents #17 of 55Top 35%
TC Tohoku Steel Co.: 2 patents #1 of 33Top 4%
NC Nippon Light Metal Company: 1 patents #203 of 499Top 45%
FC Furukawa Electric Co.: 1 patents #1,242 of 2,370Top 55%
NC Nihon Ceratec Co.: 1 patents #2 of 27Top 8%
MC Mtc Co.: 1 patents #1 of 20Top 5%
DI Daikin Industries: 1 patents #1,764 of 2,957Top 60%
MC Mitsui Engineering & Shipbuilding Co.: 1 patents #166 of 496Top 35%
KI Kurita Water Industries: 1 patents #167 of 384Top 45%
KC Kuraray Co.: 1 patents #981 of 1,827Top 55%
KU Kumamoto University: 1 patents #5 of 44Top 15%
TI Toyota Industries: 1 patents #904 of 1,610Top 60%
TL Toyota Central R&D Labs: 1 patents #823 of 1,657Top 50%
PA Panasonic: 1 patents #13,264 of 21,108Top 65%
KM Kabushiki Kaisha Motoyamaseisakusho: 1 patents #4 of 17Top 25%
IC Ibiden Co.: 1 patents #451 of 730Top 65%
TS Toshiba Mitsubishi-Electric Industrial Systems: 1 patents #206 of 368Top 60%
TK Toyo Denki Seizo Kabushiki Kaisha: 1 patents #10 of 29Top 35%
UI Ube Industries: 1 patents #895 of 1,686Top 55%
Applied Materials: 1 patents #4,780 of 7,310Top 70%
HP Hamamatsu Photonics: 1 patents #67 of 131Top 55%
PU President Of Tohoku University: 1 patents #10 of 28Top 40%
S- S-Tec: 1 patents #49 of 93Top 55%
NC Nissho Engineering Co.: 1 patents #7 of 26Top 30%
📍 Rifu, JP: #1 of 2,101 inventorsTop 1%
Overall (All Time): #255 of 4,157,543Top 1%
600
Patents All Time

Issued Patents All Time

Showing 501–525 of 600 patents

Patent #TitleCo-InventorsDate
5469085 Source follower using two pairs of NMOS and PMOS transistors Tadashi Shibata 1995-11-21
5447053 Method and device for measuring quantities of impurities in special gas 1995-09-05
5444379 Electric conductivity measuring cell Yoshio Ishihara, Ryosuke Fukushima 1995-08-22
5444259 Plasma processing apparatus 1995-08-22
5439596 Method of producing pure water, system therefor and cleaning method therefor Isamu Sugiyama 1995-08-08
5438001 Method and device for measuring variation in decomposition rate of special material gas 1995-08-01
5432732 Dynamic semiconductor memory 1995-07-11
5428990 Method of evaluation segregation of solid-liquid interface and segregation apparatus thereof 1995-07-04
5418017 Method of forming oxide film 1995-05-23
5415718 Reactive ion etching device Yasuhiko Kasama, Hirobumi Fukui 1995-05-16
5414361 Method of measuring very small quantity of impurity in gas Yoshio Ishihara, Ryosuke Fukushima 1995-05-09
5409569 Etchant, detergent and device/apparatus manufacturing method Hitoshi Seki, Satoshi Miyazawa, Kazuko Ogino, Akira Abe, Tsutomu Nakamura +2 more 1995-04-25
5407492 Process for forming passivated film Yoshiyuki Nakahara, Takashi Sakanaka, Eiji Ohta, Satoshi Mizokami 1995-04-18
5384476 Short channel MOSFET with buried anti-punch through region Jun-ichi Nishizawa 1995-01-24
5382423 Apparatus for recovering calcium fluoride from fluoroetchant Hiroyuki Harada, Nobuhiro Miki, Toshiro Fukutome, Matagoro Maeno, Norio Terasawa +2 more 1995-01-17
5372647 Apparatus for forming thin film 1994-12-13
5370274 Apparatus for cleaning a wafer surface Tadashi Shibata 1994-12-06
5366261 Pipe joint with a gasket retainer Tsutomu Shinohara, Michio Yamaji, Nobukazu Ikeda, Kenji Yamamoto 1994-11-22
5362672 Method of forming a monocrystalline film having a closed loop step portion on the substrate Tadashi Shibata, Masaru Umeda 1994-11-08
5362461 Method for recovering calcium fluoride from fluoroetchant Hiroyuki Harada, Nobuhiro Miki, Toshiro Fukutome, Matagoro Maeno, Norio Terasawa +2 more 1994-11-08
5360768 Method of forming oxide film Mizuho Morita 1994-11-01
5352917 Electronic device provided with metal fluoride film 1994-10-04
5326035 High purity cleaning system Michiya Kawakami, Yasuyuki Yagi, Makoto Ohwada, Kiyoshi Takahara 1994-07-05
5318706 Method of supplying dilute hydrofluoric acid and apparatus for use in this method for supplying the acid Nobuhiro Miki, Matagoro Maeno, Ryozi Hirayama 1994-06-07
5316645 Plasma processing apparatus Atsushi Yamagami, Nobuyuki Okamura, Haruhiro Harry Goto, Tadashi Shibata 1994-05-31