SM

Sanjay Malik

FU Fujifilm Electronic Materials U.S.A.: 22 patents #1 of 77Top 2%
AC Arch Specialty Chemicals: 12 patents #4 of 79Top 6%
OC Olin Microelectronic Chemicals: 2 patents #14 of 33Top 45%
AC Arch Chemicals: 1 patents #51 of 123Top 45%
CR Council Of Scientific And Industrial Research: 1 patents #1,642 of 4,648Top 40%
📍 Attleboro, MA: #12 of 647 inventorsTop 2%
🗺 Massachusetts: #1,962 of 88,656 inventorsTop 3%
Overall (All Time): #81,483 of 4,157,543Top 2%
39
Patents All Time

Issued Patents All Time

Showing 26–39 of 39 patents

Patent #TitleCo-InventorsDate
6830870 Acetal protected polymers and photoresists compositions thereof Stephanie Dilocker, Binod B. De 2004-12-14
6803434 Process for producing anhydride-containing polymers for radiation sensitive compositions Stephanie Dilocker, Binod B. De, Ashok Reddy 2004-10-12
6783917 Silicon-containing acetal protected polymers and photoresists compositions thereof Andrew J. Blakeney, Stephanie Dilocker, John Ferri, Jeffery Eisele 2004-08-31
6610808 Thermally cured underlayer for lithographic application Binod B. De, Gregory Spaziano, John Biafore, Patrick Foster, Sidney George Slater +2 more 2003-08-26
6380317 Production of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulations Andrew J. Blakeney, Lawrence Ferreira, Joseph J. Sizensky, Brian Edison Maxwell 2002-04-30
6312870 t-butyl cinnamate polymers and their use in photoresist compositions Lawrence Ferreira, Jeffrey Eisele, Whewell Allyn 2001-11-06
6309793 Production of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulations Andrew J. Blakeney, Lawrence Ferreira, Joseph J. Sizensky, Brian Edison Maxwell 2001-10-30
6200480 Method of purifying photoacid generators for use in photoresist compositions Lawrence Ferreira 2001-03-13
6159653 Production of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulations Andrew J. Blakeney, Lawrence Ferreira, Joseph J. Sizensky, Brian Edison Maxwell 2000-12-12
6143467 Photosensitive polybenzoxazole precursor compositions Steve Lien-Chung Hsu, Pamela J. Waterson, Ahmad A. Naiini, William D. Weber, Andrew J. Blakeney 2000-11-07
6133412 Production of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulations Andrew J. Blakeney, Lawrence Ferreira, Joseph J. Sizensky, Brian Edison Maxwell 2000-10-17
6027853 Process for preparing a radiation-sensitive composition Andrew J. Blakeney, Joseph J. Sizensky 2000-02-22
5985507 Selected high thermal novolaks and positive-working radiation-sensitive compositions Andrew J. Blakeney, Medhat A. Toukhy, Joseph J. Sizensky 1999-11-16
5080121 Process for the preparation of a new polymer useful for drag reduction in hydrocarbon fluids in exceptionally dilute polymer solutions Satish N. Shintre, Raghunath Anant Mashelkar 1992-01-14