Issued Patents All Time
Showing 51–75 of 83 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7205265 | Cleaning compositions and methods of use thereof | — | 2007-04-17 |
| 7157415 | Post etch cleaning composition for dual damascene system | Catherine M. Peyne, David J. Maloney, Shihying Lee, Leslie W. Arkless | 2007-01-02 |
| 7144849 | Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials | Charles U. Pittman, Jr., Robert J. Small | 2006-12-05 |
| 7074640 | Method of making barrier layers | David J. Maloney, Paul Roman, Michael Fury | 2006-07-11 |
| 7051742 | Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials | Charles U. Pittman, Jr., Robert J. Small | 2006-05-30 |
| 6825156 | Semiconductor process residue removal composition and process | Katy Ip, Xuan-Dung Dinh, David J. Maloney | 2004-11-30 |
| 6777380 | Compositions for cleaning organic and plasma etched residues for semiconductor devices | Robert J. Small, Bakul Patel, Douglas Holmes, Jerome Daviot, Chris Reid | 2004-08-17 |
| 6696363 | Method of and apparatus for substrate pre-treatment | David J. Maloney, Paul Roman, Michael Fury, Ross Hill, Clifford Henderson +1 more | 2004-02-24 |
| 6564812 | Alkanolamine semiconductor process residue removal composition and process | — | 2003-05-20 |
| 6566276 | Method of making electronic materials | David J. Maloney, Paul Roman, Michael Fury, Ross Hill | 2003-05-20 |
| 6492311 | Ethyenediaminetetraacetic acid or its ammonium salt semiconductor process residue removal composition and process | Zhefei J. Chen | 2002-12-10 |
| 6417112 | Post etch cleaning composition and process for dual damascene system | Catherine M. Peyne, David J. Maloney, Shihying Lee, Leslie W. Arkless | 2002-07-09 |
| 6399551 | Alkanolamine semiconductor process residue removal process | — | 2002-06-04 |
| 6367486 | Ethylenediaminetetraacetic acid or its ammonium salt semiconductor process residue removal process | Zhefei J. Chen | 2002-04-09 |
| 6319885 | Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials | Charles U. Pittman, Jr., Robert J. Small | 2001-11-20 |
| 6276372 | Process using hydroxylamine-gallic acid composition | — | 2001-08-21 |
| 6242400 | Method of stripping resists from substrates using hydroxylamine and alkanolamine | — | 2001-06-05 |
| 6221818 | Hydroxylamine-gallic compound composition and process | — | 2001-04-24 |
| 6187730 | Hydroxylamine-gallic compound composition and process | — | 2001-02-13 |
| 6140287 | Cleaning compositions for removing etching residue and method of using | — | 2000-10-31 |
| 6121217 | Alkanolamine semiconductor process residue removal composition and process | — | 2000-09-19 |
| 6110881 | Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials | Charles U. Pittman, Jr., Robert J. Small | 2000-08-29 |
| 6000411 | Cleaning compositions for removing etching residue and method of using | — | 1999-12-14 |
| 5911835 | Method of removing etching residue | Charles U. Pittman, Jr., Robert J. Small | 1999-06-15 |
| 5902780 | Cleaning compositions for removing etching residue and method of using | — | 1999-05-11 |