Issued Patents All Time
Showing 25 most recent of 34 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7923424 | Semiconductor cleaning using superacids | — | 2011-04-12 |
| 7456140 | Compositions for cleaning organic and plasma etched residues for semiconductor devices | Bakul Patel, Wai Mun Lee, Douglas Holmes, Jerome Daviot, Chris Reid | 2008-11-25 |
| 7419911 | Compositions and methods for rapidly removing overfilled substrates | Philippe H. Chelle | 2008-09-02 |
| 7387130 | Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials | Wai Mun Lee, Charles U. Pittman, Jr. | 2008-06-17 |
| 7314823 | Chemical mechanical polishing composition and process | Laurence McGhee, David J. Maloney, Maria Peterson | 2008-01-01 |
| 7276180 | Chemical mechanical polishing composition and process | Laurence McGhee, David J. Maloney, Maria Peterson | 2007-10-02 |
| 7273060 | Methods for chemically treating a substrate using foam technology | Bakul Patel, Mihaela Cernat | 2007-09-25 |
| 7247566 | CMP method for copper, tungsten, titanium, polysilicon, and other substrates using organosulfonic acids as oxidizers | Melvin Keith Carter, Xiaowei Shang, Donald W. Frey | 2007-07-24 |
| 7144849 | Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials | Wai Mun Lee, Charles U. Pittman, Jr. | 2006-12-05 |
| 7135445 | Process for the use of bis-choline and tris-choline in the cleaning of quartz-coated polysilicon and other materials | Richard W. Charm, De-Ling Zhou, Shihying Lee | 2006-11-14 |
| 7051742 | Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials | Wai Mun Lee, Charles U. Pittman, Jr. | 2006-05-30 |
| 7033409 | Compositions for chemical mechanical planarization of tantalum and tantalum nitride | Maria Peterson, Tuan Truong, Melvin Keith Carter, Lily Yao | 2006-04-25 |
| 7033942 | Chemical mechanical polishing composition and process | Laurence McGhee, David J. Maloney, Maria Peterson | 2006-04-25 |
| 6916772 | Sulfoxide pyrolid(in)one alkanolamine cleaner composition | De-Ling Zhou | 2005-07-12 |
| 6866792 | Compositions for chemical mechanical planarization of copper | Maria Peterson, Tuan Truong, Melvin Keith Carter, Lily Yao | 2005-03-15 |
| 6852682 | Composition for cleaning chemical mechanical planarization apparatus | Joo Yun Lee | 2005-02-08 |
| 6777380 | Compositions for cleaning organic and plasma etched residues for semiconductor devices | Bakul Patel, Wai Mun Lee, Douglas Holmes, Jerome Daviot, Chris Reid | 2004-08-17 |
| 6756308 | Chemical-mechanical planarization using ozone | Xiaowei Shang | 2004-06-29 |
| 6645930 | Clean room wipes for neutralizing caustic chemicals | Danny Wallis | 2003-11-11 |
| 6638326 | Compositions for chemical mechanical planarization of tantalum and tantalum nitride | Maria Peterson, Tuan Truong, Melvin Keith Carter, Lily Yao | 2003-10-28 |
| 6635186 | Chemical mechanical polishing composition and process | Laurence McGhee, David J. Maloney, Maria Peterson | 2003-10-21 |
| 6546939 | Post clean treatment | — | 2003-04-15 |
| 6498131 | Composition for cleaning chemical mechanical planarization apparatus | Joo Yun Lee | 2002-12-24 |
| 6319885 | Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials | Wai Mun Lee, Charles U. Pittman, Jr. | 2001-11-20 |
| 6313039 | Chemical mechanical polishing composition and process | Laurence McGhee, David J. Maloney, Maria Peterson | 2001-11-06 |