Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7479474 | Reducing oxide loss when using fluoride chemistries to remove post-etch residues in semiconductor processing | Mihaela Cernat | 2009-01-20 |
| 7157415 | Post etch cleaning composition for dual damascene system | Catherine M. Peyne, David J. Maloney, Wai Mun Lee, Leslie W. Arkless | 2007-01-02 |
| 7144848 | Cleaning compositions containing hydroxylamine derivatives and processes using same for residue removal | De-Ling Zhou, Jing Qiao, Bakul Patel, Becky Min Hon | 2006-12-05 |
| 7135445 | Process for the use of bis-choline and tris-choline in the cleaning of quartz-coated polysilicon and other materials | Richard W. Charm, De-Ling Zhou, Robert J. Small | 2006-11-14 |
| 6417112 | Post etch cleaning composition and process for dual damascene system | Catherine M. Peyne, David J. Maloney, Wai Mun Lee, Leslie W. Arkless | 2002-07-09 |