Issued Patents All Time
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7531275 | Photomask assembly and method for protecting the same from contaminants generated during a lithography process | Xun Zhang, Janice M. Paduano, Xiaoming Chen, Julio Reyes | 2009-05-12 |
| 7271950 | Apparatus and method for optimizing a pellicle for off-axis transmission of light | Gregory P. Hughes, Franklin D. Kalk, Hakki Ufuk Alpay | 2007-09-18 |
| 7094505 | Photomask assembly and method for protecting the same from contaminants generated during a lithography process | Xun Zhang, Janice M. Paduano, Xiaoming Chen, Julio Reyes | 2006-08-22 |
| 6911283 | Method and apparatus for coupling a pellicle to a photomask using a non-distorting mechanism | Gregory P. Hughes, Franklin D. Kalk, Hakki Ufuk Alpay, Glenn E. Storm | 2005-06-28 |
| 6894766 | Method for constructing a photomask assembly using an encoded mark | Craig West, Glenn E. Storm, Susan S. MacDonald, James Carroll | 2005-05-17 |
| 6841309 | Damage resistant photomask construction | H. Ufuk Alpay, Gregory P. Hughes, Franklin D. Kalk | 2005-01-11 |
| 6803158 | Photomask and method for forming an opaque border on the same | Gregory P. Hughes, Franklin D. Kalk, Hakki Ufuk Alpay | 2004-10-12 |
| 6586159 | Method for using a coated fluoropolymer substrate pellicle in semiconductor fabrication | — | 2003-07-01 |
| 6582859 | Dust cover for use in semiconductor fabrication | — | 2003-06-24 |
| 6280885 | Dust cover comprising anti-reflective coating | — | 2001-08-28 |