JP

Janice M. Paduano

TP Toppan Photomasks: 2 patents #6 of 25Top 25%
📍 Hyde Park, NY: #115 of 223 inventorsTop 55%
🗺 New York: #48,759 of 115,490 inventorsTop 45%
Overall (All Time): #2,134,885 of 4,157,543Top 55%
2
Patents All Time

Issued Patents All Time

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
7531275 Photomask assembly and method for protecting the same from contaminants generated during a lithography process Xun Zhang, Joseph Gordon, Xiaoming Chen, Julio Reyes 2009-05-12
7094505 Photomask assembly and method for protecting the same from contaminants generated during a lithography process Xun Zhang, Joseph Gordon, Xiaoming Chen, Julio Reyes 2006-08-22