Issued Patents All Time
Showing 26–47 of 47 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6452091 | Method of producing thin-film single-crystal device, solar cell module and method of producing the same | Katsumi Nakagawa, Takao Yonehara, Kiyofumi Sakaguchi, Noritaka Ukiyo, Masaaki Iwane +1 more | 2002-09-17 |
| 6435130 | Plasma CVD apparatus and plasma processing method | Satoshi Takaki, Yoshio Segi, Atsushi Yamagami, Hiroyuki Katagiri, Hitoshi Murayama | 2002-08-20 |
| 6406554 | Method and apparatus for producing electrophotographic photosensitive member | Hiroyuki Katagiri, Yoshio Segi, Hideaki Matsuoka | 2002-06-18 |
| 6365308 | Light receiving member for electrophotography | Satoshi Kojima, Keishi Saito, Hirokazu Ohtoshi, Masafumi Sano, Junichiro Hashizume +2 more | 2002-04-02 |
| 6335281 | Deposited film forming process | Yoshio Segi, Hideaki Matsuoka, Hiroyuki Katagiri | 2002-01-01 |
| 6223684 | Film deposition apparatus | Yasushi Fujioka, Masahiro Kanai | 2001-05-01 |
| 6158382 | Method for forming a deposited film by plasma chemical vapor deposition and apparatus for forming a deposited film by plasma chemical vapor deposition | Yoshio Segi, Hiroyuki Katagiri | 2000-12-12 |
| 6156472 | Method of manufacturing electrophotographic photosensitive member | Yoshio Segi, Hideaki Matsuoka, Hiroyuki Katagiri | 2000-12-05 |
| 6103442 | Method and apparatus for producing electrophotographic photosensitive member | Hiroyuki Katagiri, Yoshio Segi, Hideaki Matsuoka | 2000-08-15 |
| 5943531 | Electrophotographic apparatus, image forming method, and process for fabricating light receiving member for electrophotography | Yoshio Segi, Hiroyuki Katagiri | 1999-08-24 |
| 5853936 | Light receiving member, substrate for said light receiving member, and electrophotographic apparatus having said light receiving member | Yoshio Segi, Hiroyuki Katagiri, Hideaki Matsuoka, Toshiyuki Ehara | 1998-12-29 |
| 5624776 | Electrophotographic photosensitive member provided with a light receiving layer composed of a non-single crystal silicon material containing columnar structure regions and process for the production thereof | Tetsuya Takei, Hirokazu Ohtoshi, Takehito Yoshino, Ryuji Okamura | 1997-04-29 |
| 5597623 | Process for using microwave plasma CVD | Tetsuya Takei, Hirokazu Otoshi, Ryuji Okamura | 1997-01-28 |
| 5514506 | Light receiving member having a multi-layered light receiving layer with an enhanced concentration of hydrogen or/and halogen atoms in the vicinity of the interface of adjacent layers | Tetsuya Takei, Hirokazu Otoshi, Ryuji Okamura, Hiroyuki Katagiri, Satoshi Kojima | 1996-05-07 |
| 5480627 | Method for treating substrate for electrophotographic photosensitive member and method for making electrophotographic photosensitive member | Tetsuya Takei, Hirokazu Ohtoshi, Ryuji Okamura, Hiroyuki Katagiri | 1996-01-02 |
| 5443645 | Microwave plasma CVD apparatus comprising coaxially aligned multiple gas pipe gas feed structure | Hirokazu Otoshi, Tetsuya Takei, Ryuji Okamura, Shigeru Shirai, Teruo Misumi | 1995-08-22 |
| 5400630 | Method for producing regenerated cylinder, method for producing regenerated electrophotography photosensitive drum employing the method, and bulging apparatus for the methods | Toru Okumura, Eiichi Kato | 1995-03-28 |
| 5360484 | Microwave plasma CVD apparatus provided with a microwave transmissive window made of specific ceramics for the formation of a functional deposited film | Tetsuya Takei, Hirokazu Otoshi, Ryuji Okamura | 1994-11-01 |
| 5314780 | Method for treating metal substrate for electro-photographic photosensitive member and method for manufacturing electrophotographic photosensitive member | Tetsuya Takei, Hirokazu Ohtoshi, Ryuji Okamura, Hiroyuki Katagiri | 1994-05-24 |
| 5284730 | Electrophotographic light-receiving member | Tetsuya Takei, Shigeru Shirai, Hirokazu Ohtoshi, Ryuji Okamura, Hiroyuki Katagiri | 1994-02-08 |
| 5273851 | Electrophotographic light-receiving member having surface region with high ratio of Si bonded to C | Tetsuya Takei, Shigeru Shirai, Hirokazu Ootoshi, Ryuji Okamura | 1993-12-28 |
| 5232507 | Apparatus for forming deposited films with microwave plasma CVD method | Hirokazu Ohtoshi, Tetsuya Takei, Ryuji Okamura | 1993-08-03 |