Issued Patents All Time
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8908152 | Lithographic apparatus and device manufacturing method to determine improved absolute position of exposure fields using mark structures | Franciscus Godefridus Casper Bijnen, Patrick Warnaar, Marc Van Kemenade, Hoite Pieter Theodoor Tolsma | 2014-12-09 |