NM

Nobuo Matsuki

AK Asm Japan K.K.: 36 patents #1 of 128Top 1%
SC Sekisui Chemical Co.: 2 patents #358 of 908Top 40%
TL Tokyo Electron Limited: 1 patents #3,538 of 5,567Top 65%
Canon: 1 patents #14,899 of 19,416Top 80%
Samsung: 1 patents #49,284 of 75,807Top 70%
Overall (All Time): #77,692 of 4,157,543Top 2%
40
Patents All Time

Issued Patents All Time

Showing 26–40 of 40 patents

Patent #TitleCo-InventorsDate
6759344 Method for forming low dielectric constant interlayer insulation film Yoshinori Morisada, Atsuki Fukazawa, Manabu Kato 2004-07-06
6740367 Plasma CVD film-forming device Yoshinori Morisada 2004-05-25
6737366 Method of forming low dielectric constant insulation film for semiconductor device 2004-05-18
6653719 Silicone polymer insulation film on semiconductor substrate 2003-11-25
6631692 Plasma CVD film-forming device Yoshinori Morisada 2003-10-14
6602800 Apparatus for forming thin film on semiconductor substrate by plasma reaction 2003-08-05
6559520 Siloxan polymer film on semiconductor substrate Lee Jea Sik, Yoshinori Morisada, Satoshi Takahashi 2003-05-06
6537928 Apparatus and method for forming low dielectric constant film Seijiro Umemoto, Yasuyoshi Hyodo 2003-03-25
6514880 Siloxan polymer film on semiconductor substrate and method for forming same Lee Jea Sik, Yoshinori Morisada, Satoshi Takahashi 2003-02-04
6455445 Silicone polymer insulation film on semiconductor substrate and method for forming the film 2002-09-24
6432846 Silicone polymer insulation film on semiconductor substrate and method for forming the film 2002-08-13
6410463 Method for forming film with low dielectric constant on semiconductor substrate 2002-06-25
6383955 Silicone polymer insulation film on semiconductor substrate and method for forming the film Yuichi Naito, Yoshinori Morisada, Aya Matsunoshita 2002-05-07
6352945 Silicone polymer insulation film on semiconductor substrate and method for forming the film Yuichi Naito, Yoshinori Morisada, Aya Matsunoshita 2002-03-05
6149976 Method of manufacturing fluorine-containing silicon oxide films for semiconductor device Johannes Bart Cornelis Van Der Hilst 2000-11-21