Issued Patents All Time
Showing 1–16 of 16 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9018567 | Wafer processing apparatus with heated, rotating substrate support | Chris G. M. de Ridder, Klaas P. Boonstra, Barend J. T. Ravenhorst | 2015-04-28 |
| 8099190 | Apparatus and method for transferring two or more wafers whereby the positions of the wafers can be measured | Christianus Gerardus Maria De Ridder | 2012-01-17 |
| 8012876 | Delivery of vapor precursor from solid source | — | 2011-09-06 |
| 7749918 | Method and apparatus for processing semiconductor substrates | Frank Huussen | 2010-07-06 |
| 7718518 | Low temperature doped silicon layer formation | Peter Zagwijn, Steven R. A. Van Aerde, Pamela Rene Fischer | 2010-05-18 |
| 7674726 | Parts for deposition reactors | Albert Hasper | 2010-03-09 |
| 7273819 | Method and apparatus for processing semiconductor substrates | Frank Huussen, Menso Hendriks | 2007-09-25 |
| 7256375 | Susceptor plate for high temperature heat treatment | — | 2007-08-14 |
| 7128570 | Method and apparatus for purging seals in a thermal reactor | Frank Huussen, Herbert Terhorst, Jack Herman Van Putten | 2006-10-31 |
| 7048488 | Apparatus for transferring wafer and ring | Vladimir Kuznetsov, Christianus Gerardus Maria Ridder, Ernst Hendrik August Granneman | 2006-05-23 |
| 6902395 | Multilevel pedestal for furnace | Frank Huussen, Timothy Robert Landsmeer, Herbert Terhorst | 2005-06-07 |
| 6746240 | Process tube support sleeve with circumferential channels | Christianus Gerardus Maria De Ridder, Frank Huussen | 2004-06-08 |
| 6481945 | Method and device for transferring wafers | Albert Hasper, Frank Huussen, Cornelis Kooijman, Jack Herman Van Putten, Christianus Gerardus Maria Ridder +3 more | 2002-11-19 |
| 6413844 | Safe arsenic gas phase doping | Jacobus Johannes Beulens | 2002-07-02 |
| 6328561 | Method for cooling a furnace, and furnace provided with a cooling device | Albert Hasper, Frank Huussen, Jack Herman Van Putten | 2001-12-11 |
| 6316371 | Method for the chemical treatment of a semiconductor substrate | Frank Huussen, Remco Van Der Berg | 2001-11-13 |