MS

Mohamed Saib

AN Aselta Nanographics: 5 patents #3 of 14Top 25%
CEA: 1 patents #3,381 of 7,956Top 45%
IV Imec Vzw: 1 patents #463 of 1,046Top 45%
KL Katholieke Universiteit Leuven: 1 patents #233 of 754Top 35%
📍 Evere, BE: #2 of 17 inventorsTop 15%
Overall (All Time): #779,352 of 4,157,543Top 20%
6
Patents All Time

Issued Patents All Time

Showing 1–6 of 6 patents

Patent #TitleCo-InventorsDate
12278086 Pattern height metrology using an e-beam system Gian Francesco Lorusso, Alain Moussa, Anne-Laure Charley, Danilo De Simone, Joren Severi 2025-04-15
10578978 Method for determining the dose corrections to be applied to an IC manufacturing process by a matching procedure Patrick J. Schiavone, Thiago Figueiro, Sébastien Bayle 2020-03-03
10522328 Method of performing dose modulation, in particular for electron beam lithography Patrick J. Schiavone, Thiago Figueiro 2019-12-31
10423074 Method for calculating the metrics of an IC manufacturing process Aurélien Fay, Patrick J. Schiavone, Thiago Figueiro 2019-09-24
10295912 Method for determining the parameters of an IC manufacturing process model Patrick J. Schiavone, Thiago Figueiro 2019-05-21
10156796 Method for determining the parameters of an IC manufacturing process by a differential procedure Patrick J. Schiavone, Thiago Figueiro 2018-12-18