YL

Yijun Liu

Applied Materials: 11 patents #1,198 of 7,310Top 20%
EX ExxonMobil: 8 patents #1,388 of 10,161Top 15%
MC Monalisa Group Co.: 5 patents #1 of 25Top 4%
Huawei: 4 patents #3,171 of 15,535Top 25%
TL Tokyo Electron Limited: 4 patents #1,723 of 5,567Top 35%
TE Tencent: 3 patents #1,905 of 8,131Top 25%
AM Amgen: 2 patents #1,289 of 2,867Top 45%
AK Asm Japan K.K.: 2 patents #42 of 128Top 35%
JU Jiangsu University: 2 patents #159 of 948Top 20%
MT Marathon Gtf Technology: 2 patents #3 of 11Top 30%
SU Sun Yat-Sen University: 1 patents #56 of 264Top 25%
SE Servicenow: 1 patents #702 of 1,125Top 65%
GU Gtc Technology Us: 1 patents #30 of 53Top 60%
BC Beijing Zitiao Network Technology Co.: 1 patents #212 of 763Top 30%
AE Advanced Micro-Fabrication Equipment: 1 patents #26 of 61Top 45%
SO Sony: 1 patents #17,262 of 25,231Top 70%
📍 Camarillo, CA: #9 of 887 inventorsTop 2%
🗺 California: #6,532 of 386,348 inventorsTop 2%
Overall (All Time): #43,724 of 4,157,543Top 2%
56
Patents All Time

Issued Patents All Time

Showing 51–56 of 56 patents

Patent #TitleCo-InventorsDate
7655577 Method of forming silicon-containing insulation film having low dielectric constant and low film stress Yasuyoshi Hyodo, Nobuo Matsuki, Masashi Yamaguchi, Atsuki Fukazawa, Naoki Ohara 2010-02-02
7148154 Method of forming silicon-containing insulation film having low dielectric constant and low film stress Yasuyoshi Hyodo, Nobuo Matsuki, Masashi Yamaguchi, Atsuki Fukazawa, Naoki Ohara 2006-12-12
6756235 Metal oxide film formation method and apparatus Hiroshi Shinriki, Takashi Magara 2004-06-29
6485564 Thin film forming method Hiroshi Shinriki, Takashi Magara 2002-11-26
6428850 Single-substrate-processing CVD method of forming film containing metal element Hiroshi Shinriki, Masahito Sugiura 2002-08-06
6126753 Single-substrate-processing CVD apparatus and method Hiroshi Shinriki, Masahito Sugiura 2000-10-03