RK

Renee Koch

Applied Materials: 5 patents #2,165 of 7,310Top 30%
Overall (All Time): #1,025,780 of 4,157,543Top 25%
5
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
7786019 Multi-step photomask etching with chlorine for uniformity control Scott Anderson 2010-08-31
7520999 Method of processing a workpiece in a plasma reactor with dynamic adjustment of the plasma source power applicator and the workpiece relative to one another Madhavi R. Chandrachood, Richard Lewington, Darin Bivens, Ajay Kumar, Ibrahim M. Ibrahim +2 more 2009-04-21
7504041 Method of processing a workpiece in a plasma reactor employing a dynamically adjustable plasma source power applicator Madhavi R. Chandrachood, Richard Lewington, Darin Bivens, Ajay Kumar, Ibrahim M. Ibrahim +2 more 2009-03-17
7431797 Plasma reactor with a dynamically adjustable plasma source power applicator Madhavi R. Chandrachood, Richard Lewington, Darin Bivens, Ajay Kumar, Ibrahim M. Ibrahim +2 more 2008-10-07
7419551 Plasma reactor with apparatus for dynamically adjusting the plasma source power applicator and the workpiece relative to one another Madhavi R. Chandrachood, Richard Lewington, Darin Bivens, Ajay Kumar, Ibrahim M. Ibrahim +2 more 2008-09-02