Issued Patents All Time
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7786019 | Multi-step photomask etching with chlorine for uniformity control | Scott Anderson | 2010-08-31 |
| 7520999 | Method of processing a workpiece in a plasma reactor with dynamic adjustment of the plasma source power applicator and the workpiece relative to one another | Madhavi R. Chandrachood, Richard Lewington, Darin Bivens, Ajay Kumar, Ibrahim M. Ibrahim +2 more | 2009-04-21 |
| 7504041 | Method of processing a workpiece in a plasma reactor employing a dynamically adjustable plasma source power applicator | Madhavi R. Chandrachood, Richard Lewington, Darin Bivens, Ajay Kumar, Ibrahim M. Ibrahim +2 more | 2009-03-17 |
| 7431797 | Plasma reactor with a dynamically adjustable plasma source power applicator | Madhavi R. Chandrachood, Richard Lewington, Darin Bivens, Ajay Kumar, Ibrahim M. Ibrahim +2 more | 2008-10-07 |
| 7419551 | Plasma reactor with apparatus for dynamically adjusting the plasma source power applicator and the workpiece relative to one another | Madhavi R. Chandrachood, Richard Lewington, Darin Bivens, Ajay Kumar, Ibrahim M. Ibrahim +2 more | 2008-09-02 |