OJ

Olivier Joubert

Applied Materials: 18 patents #731 of 7,310Top 10%
CEA: 7 patents #594 of 7,956Top 8%
CN CNRS: 6 patents #293 of 11,908Top 3%
FT France Telecom: 3 patents #166 of 1,583Top 15%
UF Université Joseph Fourier: 2 patents #26 of 284Top 10%
UA Universite Grenoble Alpes: 1 patents #96 of 431Top 25%
CT Crocus Technology: 1 patents #20 of 35Top 60%
EF Electricite De France: 1 patents #99 of 546Top 20%
IS Imertech Sas: 1 patents #27 of 104Top 30%
🗺 California: #17,156 of 386,348 inventorsTop 5%
Overall (All Time): #121,091 of 4,157,543Top 3%
30
Patents All Time

Issued Patents All Time

Showing 26–30 of 30 patents

Patent #TitleCo-InventorsDate
6818488 Process for making a gate for a short channel CMOS transistor structure Giles Cunge, Johann Foucher, David Fuard, Marceline Bonvalot, Laurent Vallier 2004-11-16
6589715 Process for depositing and developing a plasma polymerized organosilicon photoresist film Cedric Monget, Timothy Weidman, Dian Sugiarto, David Mui 2003-07-08
6326302 Process for the anisotropic etching of an organic dielectric polymer material by a plasma gas and application in microelectronics David Fuard 2001-12-04
6271144 Process for etching a polycrystalline Si(1-x)Ge(x) layer or a stack of polycrystalline Si(1-x)Ge(x) layer and of a polycrystalline Si layer, and its application to microelectronics Cedric Monget, Sophie Vallon 2001-08-07
6238844 Process for depositing a plasma polymerized organosilicon photoresist film Cedric Monget, Timothy Weidman, Dian Sugiarto, David Mui 2001-05-29