JJ

Jay J. Jung

Applied Materials: 11 patents #1,198 of 7,310Top 20%
AC Advanced Technology & Materials Co.: 1 patents #255 of 410Top 65%
EC Emc Ip Holding Company: 1 patents #2,584 of 4,608Top 60%
II Ionics, Incorporated: 1 patents #47 of 71Top 70%
Overall (All Time): #308,718 of 4,157,543Top 8%
15
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
12338573 Method for manufacturing antibacterial and deodorizing agent, using eco-friendly biopolymer Ji-Young Kim 2025-06-24
11954344 Host device comprising layered software architecture with automated tiering of logical storage devices Sanjib Mallick, Vinay G. Rao, Arieh Don 2024-04-09
11049735 Methods and apparatus for conserving electronic device manufacturing resources Daniel O. Clark, Phil Chandler 2021-06-29
9685352 Apparatus for conserving electronic device manufacturing resources including ozone Daniel O. Clark, Phil Chandler 2017-06-20
9080576 Method and apparatus for controlling a processing system Youssef A. Loldj, Mehran Moalem, Paul Fisher, Joshua Putz, Andreas Neuber 2015-07-14
9075408 Energy savings and global gas emissions monitoring and display Youssef A. Loldj, Maxime Cayer, Shaun W. Crawford, Dana Tribula, Daniel O. Clark 2015-07-07
8974605 Methods and apparatus for conserving electronic device manufacturing resources Daniel O. Clark, Phil Chandler 2015-03-10
8668868 Methods and apparatus for smart abatement using an improved fuel circuit Ho-Man Rodney Chiu, Daniel O. Clark, Shaun W. Crawford, Youssef A. Loldj, Robbert M. Vermeulen 2014-03-11
8455368 Methods and apparatus for assembling and operating electronic device manufacturing systems Phil Chandler, Daniel O. Clark, Robbert M. Vermeulen, Roger M. Johnson, Youssef A. Loldj +1 more 2013-06-04
8095240 Methods for starting and operating a thermal abatement system Ho-Man Rodney Chiu, Daniel O. Clark, Shaun W. Crawford, Youssef A. Loldj, Robbert M. Vermeulen 2012-01-10
7985379 Reactor design to reduce particle deposition during process abatement Ho-Man Rodney Chiu, Daniel O. Clark, Shaun W. Crawford, Leonard B. Todd, Robbert M. Vermeulen 2011-07-26
7736599 Reactor design to reduce particle deposition during process abatement Ho-Man Rodney Chiu, Daniel O. Clark, Shaun W. Crawford, Leonard B. Todd, Robbert M. Vermeulen 2010-06-15
7682574 Safety, monitoring and control features for thermal abatement reactor Ho-Man Rodney Chiu, Daniel O. Clark, Shaun W. Crawford, Youssef A. Loldj, Robbert M. Vermeulen 2010-03-23
7435320 Methods and apparatuses for monitoring organic additives in electrochemical deposition solutions Jianwen Han, Mackenzie King, Weihua Wang, Glenn M. Tom 2008-10-14
6613230 Method for simultaneous removal of arsenic and fluoride from aqueous solutions Gerald A. Krulik, Paul H. Dick, Josh H. Golden, Gennadiy Sverdlov 2003-09-02